Inventor
LEEWIS CHRISTIAN MARINUS
NL10 patents
⚠️ This page may combine multiple inventors who share the name “LEEWIS CHRISTIAN MARINUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
5 patentsUS9594299B2Mar 14, 2017
Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method
ASML NETHERLANDS BV13 citations80
US9436099B2Sep 6, 2016
Lithographic focus and dose measurement using a 2-D target
ASML NETHERLANDS BV5 citations71
US10871716B2Dec 22, 2020
Metrology robustness based on through-wavelength similarity
ASML NETHERLANDS BV0 citations49
US10394132B2Aug 27, 2019
Metrology robustness based on through-wavelength similarity
ASML NETHERLANDS BV0 citations49
US9939735B2Apr 10, 2018
Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method
ASML NETHERLANDS BV1 citations48
LEEWIS CHRISTIAN MARINUS
2 patentsUS8891061B2Nov 18, 2014
Lithographic focus and dose measurement using a 2-D target
LEEWIS CHRISTIAN MARINUS10 citations79
US8848195B2Sep 30, 2014
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrate
LEEWIS CHRISTIAN MARINUS0 citations48