Inventor
YUAN XIAOXIONG
US37 patents
⚠️ This page may combine multiple inventors who share the name “YUAN XIAOXIONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
26 patentsUS6302965B1Oct 16, 2001
Dispersion plate for flowing vaporizes compounds used in chemical vapor deposition of films onto semiconductor surfaces
APPLIED MATERIALS INC209 citations99
US7780789B2Aug 24, 2010
Vortex chamber lids for atomic layer deposition
APPLIED MATERIALS INC458 citations98
US6660126B2Dec 9, 2003
Lid assembly for a processing system to facilitate sequential deposition techniques
APPLIED MATERIALS INC128 citations98
US6494955B1Dec 17, 2002
Ceramic substrate support
APPLIED MATERIALS INC82 citations96
US6730175B2May 4, 2004
Ceramic substrate support
APPLIED MATERIALS INC76 citations95
US6617553B2Sep 9, 2003
Multi-zone resistive heater
APPLIED MATERIALS INC59 citations95
US6299692B1Oct 9, 2001
Head for vaporizing and flowing various precursor materials onto semiconductor wafers during chemical vapor deposition
APPLIED MATERIALS INC29 citations92
US9853579B2Dec 26, 2017
Rotatable heated electrostatic chuck
APPLIED MATERIALS INC9 citations84
US9888528B2Feb 6, 2018
Substrate support with multiple heating zones
APPLIED MATERIALS INC11 citations83
US10407771B2Sep 10, 2019
Atomic layer deposition chamber with thermal lid
APPLIED MATERIALS INC12 citations81
US11555244B2Jan 17, 2023
High temperature dual chamber showerhead
APPLIED MATERIALS INC4 citations73
US10857655B2Dec 8, 2020
Substrate support plate with improved lift pin sealing
APPLIED MATERIALS INC3 citations72
US9916994B2Mar 13, 2018
Substrate support with multi-piece sealing surface
APPLIED MATERIALS INC2 citations72
USD1052548SNov 26, 2024
Gas diffuser
APPLIED MATERIALS INC5 citations70
US11628456B2Apr 18, 2023
Apparatus for increasing flux from an ampoule
APPLIED MATERIALS INC0 citations62
US11421322B2Aug 23, 2022
Blocker plate for use in a substrate process chamber
APPLIED MATERIALS INC0 citations62
US11059061B2Jul 13, 2021
Apparatus for increasing flux from an ampoule
APPLIED MATERIALS INC0 citations62
US10752990B2Aug 25, 2020
Apparatus and methods to remove residual precursor inside gas lines post-deposition
APPLIED MATERIALS INC1 citations62
US10508339B2Dec 17, 2019
Blocker plate for use in a substrate process chamber
APPLIED MATERIALS INC1 citations62
US9017776B2Apr 28, 2015
Apparatuses and methods for atomic layer deposition
APPLIED MATERIALS INC1 citations61
US12249494B2Mar 11, 2025
Remote plasma cleaning of chambers for electronics manufacturing systems
APPLIED MATERIALS INC0 citations59
US11854773B2Dec 26, 2023
Remote plasma cleaning of chambers for electronics manufacturing systems
APPLIED MATERIALS INC0 citations59
USD1116010SMar 3, 2026
Gas diffuser assembly
APPLIED MATERIALS INC0 citations58
US12016092B2Jun 18, 2024
Gas distribution ceramic heater for deposition chamber
APPLIED MATERIALS INC0 citations58
US12486576B2Dec 2, 2025
Shadow ring lift to improve wafer edge performance
APPLIED MATERIALS INC0 citations52
US11598003B2Mar 7, 2023
Substrate processing chamber having heated showerhead assembly
APPLIED MATERIALS INC0 citations52
TZU GWO-CHUAN
3 patentsUS9490150B2Nov 8, 2016
Substrate support for substrate backside contamination control
TZU GWO-CHUAN17 citations82
US8920564B2Dec 30, 2014
Methods and apparatus for thermal based substrate processing with variable temperature capability
TZU GWO-CHUAN4 citations69
US9783889B2Oct 10, 2017
Apparatus for variable substrate temperature control
TZU GWO-CHUAN1 citations50