Inventor
OKAMOTO YOSHIHIKO
JP63 patents
⚠️ This page may combine multiple inventors who share the name “OKAMOTO YOSHIHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
36 patentsUS5045417ASep 3, 1991
Mask for manufacturing semiconductor device and method of manufacture thereof
HITACHI LTD197 citations99
US5352550AOct 4, 1994
Mask for manufacturing semiconductor devices and method of manufacture thereof
HITACHI LTD62 citations97
US5502001AMar 26, 1996
Method of forming light beam and method of fabricating semiconductor integrated circuits
HITACHI LTD54 citations96
US5418092AMay 23, 1995
Process for manufacturing semiconductor integrated circuit device, exposure method and mask for the process
HITACHI LTD82 citations96
US5386623AFeb 7, 1995
Process for manufacturing a multi-chip module
HITACHI LTD101 citations96
US5298365AMar 29, 1994
Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process
HITACHI LTD59 citations96
US5973785AOct 26, 1999
Method of forming light beam, apparatus therefor, method of measuring sizes using the same, method of inspecting appearance, method of measuring height, method of exposure, and method of fabricating semiconductor integrated circuits
HITACHI LTD34 citations93
US5837423ANov 17, 1998
Semiconductor IC device fabricating method
HITACHI LTD23 citations93
US5691115ANov 25, 1997
Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices
HITACHI LTD19 citations93
US5641715AJun 24, 1997
Semiconductor IC device fabricating method
HITACHI LTD21 citations93
US5411823AMay 2, 1995
Exposure method, phase shift mask used in the same, and process of fabricating semiconductor integrated circuit device using the same
HITACHI LTD26 citations93
US6153357ANov 28, 2000
Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process
HITACHI LTD16 citations92
US5786112AJul 28, 1998
Photomask manufacturing process and semiconductor integrated circuit device manufacturing process using the photomask
HITACHI LTD37 citations92
US5757409AMay 26, 1998
Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus
HITACHI LTD25 citations92
US5557314ASep 17, 1996
Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus
HITACHI LTD20 citations92
US5306585AApr 26, 1994
Mask for manufacturing semiconductor device and method of manufacture thereof
HITACHI LTD19 citations86
US6420075B1Jul 16, 2002
Mask for manufacturing semiconductor device and method of manufacture thereof
HITACHI LTD12 citations82
US5830606ANov 3, 1998
Mask for manufacturing semiconductor device and method of manufacture thereof
HITACHI LTD7 citations82
US5753416AMay 19, 1998
Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process
HITACHI LTD16 citations82
US5667941ASep 16, 1997
Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process
HITACHI LTD17 citations82
US5484671AJan 16, 1996
Mask for manufacturing semiconductor device and method of manufacture thereof
HITACHI LTD7 citations82
US5455144AOct 3, 1995
Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process
HITACHI LTD19 citations82
US5358807AOct 25, 1994
Mask for manufacturing semiconductor device and method of manufacture thereof
HITACHI LTD12 citations82
US6309800B1Oct 30, 2001
Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process
HITACHI LTD9 citations74
US6284414B1Sep 4, 2001
Mask for manufacturing semiconductor device and method of manufacture thereof
HITACHI LTD4 citations74
US6106981AAug 22, 2000
Mask for manufacturing semiconductor device and method of manufacture thereof
HITACHI LTD3 citations74
US6020109AFeb 1, 2000
Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices
HITACHI LTD11 citations74
US5948574ASep 7, 1999
Mask for manufacturing semiconductor device and method of manufacture thereof
HITACHI LTD5 citations74
US5902705AMay 11, 1999
Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices
HITACHI LTD8 citations74
US5643698AJul 1, 1997
Mask for manufacturing semiconductor device and method of manufacture thereof
HITACHI LTD2 citations74
US5631108AMay 20, 1997
Mask for manufacturing semiconductor device and method of manufacture thereof
HITACHI LTD3 citations74
US5521033AMay 28, 1996
Process for manufacturing semiconductor integrated circuit device, exposure method and mask for the process
HITACHI LTD13 citations74
US5350649ASep 27, 1994
Mask for manufacturing semiconductor device and method of manufacture thereof
HITACHI LTD3 citations74
US5311026AMay 10, 1994
Charged particle beam lithography system and method therefor
HITACHI LTD9 citations74
US6432790B1Aug 13, 2002
Method of manufacturing photomask, photomask, and method of manufacturing semiconductor integrated circuit device
HITACHI LTD12 citations71
US6548213B2Apr 15, 2003
Mask for manufacturing semiconductor device and method of manufacture thereof
HITACHI LTD0 citations63
FUJI PHOTO FILM CO LTD
7 patentsUS4417260ANov 22, 1983
Image scanning system
FUJI PHOTO FILM CO LTD55 citations96
US4410799AOct 18, 1983
Device for controlling radiation image information read out gain
FUJI PHOTO FILM CO LTD41 citations93
US4278347AJul 14, 1981
Cathode-ray tube image recording device
FUJI PHOTO FILM CO LTD24 citations81
US4676582AJun 30, 1987
Radiation image read-out and reproducing apparatus
FUJI PHOTO FILM CO LTD7 citations74
US4120722AOct 17, 1978
Thermal development of imaged light-sensitive recording material using microwaves
FUJI PHOTO FILM CO LTD10 citations74
US3938164AFeb 10, 1976
Device for thermally recording a cathode-ray tube image
FUJI PHOTO FILM CO LTD15 citations74
US4975580ADec 4, 1990
Radiation image read-out and reproducing apparatus
FUJI PHOTO FILM CO LTD11 citations72
RENESAS TECH CORP
3 patentsUS7008736B2Mar 7, 2006
Semiconductor integrated circuit device fabrication method using a mask having a phase shifting film covering region and an opening region
RENESAS TECH CORP3 citations74
US6794118B2Sep 21, 2004
Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process
RENESAS TECH CORP4 citations74
US6733933B2May 11, 2004
Mask for manufacturing semiconductor device and method of manufacture thereof
RENESAS TECH CORP1 citations63
CANON KK
3 patentsUS10749379B2Aug 18, 2020
Power supply apparatus and control method thereof
CANON KK4 citations73
US10511190B2Dec 17, 2019
Power transmission apparatus wirelessly transmitting power to power receiving apparatus
CANON KK2 citations73
US10886787B2Jan 5, 2021
Power supply apparatus capable of supplying power to multiple power receiving apparatuses, control method thereof, and storage medium
CANON KK2 citations68
TOKYO ELECTRON LTD
1 patentShowing the top 50 of 63 patents by PatentIndex Score.