P

Inventor

OKAMOTO YOSHIHIKO

JP63 patents
⚠️ This page may combine multiple inventors who share the name “OKAMOTO YOSHIHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI LTD

36 patents
US5045417ASep 3, 1991

Mask for manufacturing semiconductor device and method of manufacture thereof

HITACHI LTD197 citations99
US5352550AOct 4, 1994

Mask for manufacturing semiconductor devices and method of manufacture thereof

HITACHI LTD62 citations97
US5502001AMar 26, 1996

Method of forming light beam and method of fabricating semiconductor integrated circuits

HITACHI LTD54 citations96
US5418092AMay 23, 1995

Process for manufacturing semiconductor integrated circuit device, exposure method and mask for the process

HITACHI LTD82 citations96
US5386623AFeb 7, 1995

Process for manufacturing a multi-chip module

HITACHI LTD101 citations96
US5298365AMar 29, 1994

Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process

HITACHI LTD59 citations96
US5973785AOct 26, 1999

Method of forming light beam, apparatus therefor, method of measuring sizes using the same, method of inspecting appearance, method of measuring height, method of exposure, and method of fabricating semiconductor integrated circuits

HITACHI LTD34 citations93
US5837423ANov 17, 1998

Semiconductor IC device fabricating method

HITACHI LTD23 citations93
US5691115ANov 25, 1997

Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices

HITACHI LTD19 citations93
US5641715AJun 24, 1997

Semiconductor IC device fabricating method

HITACHI LTD21 citations93
US5411823AMay 2, 1995

Exposure method, phase shift mask used in the same, and process of fabricating semiconductor integrated circuit device using the same

HITACHI LTD26 citations93
US6153357ANov 28, 2000

Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process

HITACHI LTD16 citations92
US5786112AJul 28, 1998

Photomask manufacturing process and semiconductor integrated circuit device manufacturing process using the photomask

HITACHI LTD37 citations92
US5757409AMay 26, 1998

Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus

HITACHI LTD25 citations92
US5557314ASep 17, 1996

Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus

HITACHI LTD20 citations92
US5306585AApr 26, 1994

Mask for manufacturing semiconductor device and method of manufacture thereof

HITACHI LTD19 citations86
US6420075B1Jul 16, 2002

Mask for manufacturing semiconductor device and method of manufacture thereof

HITACHI LTD12 citations82
US5830606ANov 3, 1998

Mask for manufacturing semiconductor device and method of manufacture thereof

HITACHI LTD7 citations82
US5753416AMay 19, 1998

Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process

HITACHI LTD16 citations82
US5667941ASep 16, 1997

Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process

HITACHI LTD17 citations82
US5484671AJan 16, 1996

Mask for manufacturing semiconductor device and method of manufacture thereof

HITACHI LTD7 citations82
US5455144AOct 3, 1995

Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process

HITACHI LTD19 citations82
US5358807AOct 25, 1994

Mask for manufacturing semiconductor device and method of manufacture thereof

HITACHI LTD12 citations82
US6309800B1Oct 30, 2001

Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process

HITACHI LTD9 citations74
US6284414B1Sep 4, 2001

Mask for manufacturing semiconductor device and method of manufacture thereof

HITACHI LTD4 citations74
US6106981AAug 22, 2000

Mask for manufacturing semiconductor device and method of manufacture thereof

HITACHI LTD3 citations74
US6020109AFeb 1, 2000

Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices

HITACHI LTD11 citations74
US5948574ASep 7, 1999

Mask for manufacturing semiconductor device and method of manufacture thereof

HITACHI LTD5 citations74
US5902705AMay 11, 1999

Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices

HITACHI LTD8 citations74
US5643698AJul 1, 1997

Mask for manufacturing semiconductor device and method of manufacture thereof

HITACHI LTD2 citations74
US5631108AMay 20, 1997

Mask for manufacturing semiconductor device and method of manufacture thereof

HITACHI LTD3 citations74
US5521033AMay 28, 1996

Process for manufacturing semiconductor integrated circuit device, exposure method and mask for the process

HITACHI LTD13 citations74
US5350649ASep 27, 1994

Mask for manufacturing semiconductor device and method of manufacture thereof

HITACHI LTD3 citations74
US5311026AMay 10, 1994

Charged particle beam lithography system and method therefor

HITACHI LTD9 citations74
US6432790B1Aug 13, 2002

Method of manufacturing photomask, photomask, and method of manufacturing semiconductor integrated circuit device

HITACHI LTD12 citations71
US6548213B2Apr 15, 2003

Mask for manufacturing semiconductor device and method of manufacture thereof

HITACHI LTD0 citations63

FUJI PHOTO FILM CO LTD

7 patents

RENESAS TECH CORP

3 patents

CANON KK

3 patents

TOKYO ELECTRON LTD

1 patent

Showing the top 50 of 63 patents by PatentIndex Score.