Inventor
CHUN YONG-JIN
KR4 patents
Patents
4 patentsUS7940373B2May 10, 2011
Compensating masks, multi-optical systems using the masks, and methods of compensating for 3-D mask effect using the same
SAMSUNG ELECTRONICS CO LTD2 citations60
US8045787B2Oct 25, 2011
System for analyzing mask topography and method of forming image using the system
SAMSUNG ELECTRONICS CO LTD2 citations58
US9570364B2Feb 14, 2017
Method of detecting focus shift in lithography process, method of analyzing error of transferred pattern using the same and method of manufacturing semiconductor device using the methods
SAMSUNG ELECTRONICS CO LTD0 citations49
US9606452B2Mar 28, 2017
Lithography metrology method for determining best focus and best dose and lithography monitoring method using the same
SAMSUNG ELECTRONICS CO LTD1 citations46