Inventor
FUJIMURA SHUZO
JP42 patents
⚠️ This page may combine multiple inventors who share the name “FUJIMURA SHUZO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJITSU LTD
37 patentsUS5478403ADec 26, 1995
Process and apparatus for ashing treatment
FUJITSU LTD246 citations99
US5961775AOct 5, 1999
Apparatus for removing organic resist from semiconductor
FUJITSU LTD483 citations98
US5024748AJun 18, 1991
Microwave plasma processing apparatus
FUJITSU LTD65 citations96
US4718976AJan 12, 1988
Process and apparatus for plasma treatment
FUJITSU LTD70 citations96
US4609428ASep 2, 1986
Method and apparatus for microwave plasma anisotropic dry etching
FUJITSU LTD119 citations96
US4512868AApr 23, 1985
Microwave plasma processing apparatus
FUJITSU LTD81 citations96
US5773201AJun 30, 1998
Method of stripping a resist mask
FUJITSU LTD49 citations95
US5403436AApr 4, 1995
Plasma treating method using hydrogen gas
FUJITSU LTD61 citations95
US5057187AOct 15, 1991
Ashing method for removing an organic film on a substance of a semiconductor device under fabrication
FUJITSU LTD61 citations95
US4983254AJan 8, 1991
Processing for stripping organic material
FUJITSU LTD62 citations95
US4961820AOct 9, 1990
Ashing method for removing an organic film on a substance of a semiconductor device under fabrication
FUJITSU LTD64 citations95
US5832177ANov 3, 1998
Method for controlling apparatus for supplying steam for ashing process
FUJITSU LTD59 citations94
US5773316AJun 30, 1998
Method and device for measuring physical quantity, method for fabricating semiconductor device, and method and device for measuring wavelength
FUJITSU LTD49 citations94
US4861424AAug 29, 1989
Ashing process of a resist layer formed on a substrate under fabrication to a semiconductor device
FUJITSU LTD54 citations94
US6007671ADec 28, 1999
Method for hydrogen plasma down-flow processing and apparatus thereof
FUJITSU LTD32 citations93
US5885361AMar 23, 1999
Cleaning of hydrogen plasma down-stream apparatus
FUJITSU LTD44 citations93
US4423127ADec 27, 1983
Method of manufacturing a semiconductor device
FUJITSU LTD35 citations93
US6063300AMay 16, 2000
Method of manufacturing semiconductor device including light etching
FUJITSU LTD26 citations92
US6024045AFeb 15, 2000
Apparatus for fabricating semiconductor device and method for fabricating semiconductor device
FUJITSU LTD18 citations92
US4980022ADec 25, 1990
Method of removing a layer of organic matter
FUJITSU LTD42 citations92
US4938839AJul 3, 1990
Method of removing photoresist on a semiconductor wafer
FUJITSU LTD50 citations92
US5364519ANov 15, 1994
Microwave plasma processing process and apparatus
FUJITSU LTD30 citations91
US4987284AJan 22, 1991
Downstream microwave plasma processing apparatus having an improved coupling structure between microwave plasma
FUJITSU LTD52 citations91
US4861732AAug 29, 1989
Method for removing an ion-implanted organic resin layer during fabrication of semiconductor devices
FUJITSU LTD26 citations91
US6168310B1Jan 2, 2001
Device for measuring physical quantity using pulsed laser interferometry
FUJITSU LTD16 citations90
US5397432AMar 14, 1995
Method for producing semiconductor integrated circuits and apparatus used in such method
FUJITSU LTD53 citations90
US5595916AJan 21, 1997
Silicon oxide film evaluation method
FUJITSU LTD37 citations89
US4393807AJul 19, 1983
Spinner
FUJITSU LTD46 citations87
US6107215AAug 22, 2000
Hydrogen plasma downstream treatment equipment and hydrogen plasma downstream treatment method
FUJITSU LTD16 citations84
US5919336AJul 6, 1999
Apparatus for fabricating semiconductor device and method for fabricating semiconductor device
FUJITSU LTD15 citations81
US4789427ADec 6, 1988
Method for removing resist from semiconductor device
FUJITSU LTD19 citations78
US5795494AAug 18, 1998
Semiconductor substrate cleaning method and semiconductor device fabrication method
FUJITSU LTD14 citations69
US5034090AJul 23, 1991
Process for manufacturing semiconductor device involving dry etching an organic resist layer
FUJITSU LTD2 citations63
US5998104ADec 7, 1999
Method of stripping a resist mask
FUJITSU LTD4 citations62
US5078824AJan 7, 1992
Semiconductor device manufacturing apparatus
FUJITSU LTD0 citations52
US6115538ASep 5, 2000
Steam supplying apparatus and method for controlling same
FUJITSU LTD1 citations50
USRE36224EJun 8, 1999
Microwave plasma processing process and apparatus
FUJITSU LTD1 citations50