Inventor
FERRO ARMAND P
US20 patents
⚠️ This page may combine multiple inventors who share the name “FERRO ARMAND P”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
GEN ELECTRIC
12 patentsUS4219760AAug 26, 1980
SEF Lamp dimming
GEN ELECTRIC173 citations99
US4145708AMar 20, 1979
Power module with isolated substrates cooled by integral heat-energy-removal means
GEN ELECTRIC72 citations96
US4253047AFeb 24, 1981
Starting electrodes for solenoidal electric field discharge lamps
GEN ELECTRIC32 citations92
US4037245AJul 19, 1977
Electric field controlled diode with a current controlling surface grid
GEN ELECTRIC39 citations92
US4099998AJul 11, 1978
Method of making zener diodes with selectively variable breakdown voltages
GEN ELECTRIC28 citations79
US4053922AOct 11, 1977
Light triggered thyristor having controlled turn on delay
GEN ELECTRIC8 citations74
US4012761AMar 15, 1977
Self-protected semiconductor device
GEN ELECTRIC16 citations74
US4739387AApr 19, 1988
Amplifying gate thyristor having high gate sensitivity and high dv/dt rating
GEN ELECTRIC3 citations63
US4233541ANov 11, 1980
Start winding for solenoidal electric field discharge lamps
GEN ELECTRIC5 citations63
US4128785ADec 5, 1978
Core configuration for induction ionized lamps
GEN ELECTRIC5 citations63
US4012683AMar 15, 1977
Method and apparatus for reducing inverter no-load losses
GEN ELECTRIC5 citations62
US4070602AJan 24, 1978
Spatially distributed windings to improve plasma coupling in induction ionized lamps
GEN ELECTRIC5 citations60
EPSILON TECHN INC
5 patentsUS5080549AJan 14, 1992
Wafer handling system with Bernoulli pick-up
EPSILON TECHN INC170 citations98
US4828224AMay 9, 1989
Chemical vapor deposition system
EPSILON TECHN INC557 citations98
US5020475AJun 4, 1991
Substrate handling and transporting apparatus
EPSILON TECHN INC64 citations96
US5156521AOct 20, 1992
Method for loading a substrate into a GVD apparatus
EPSILON TECHN INC30 citations92
US5092728AMar 3, 1992
Substrate loading apparatus for a CVD process
EPSILON TECHN INC51 citations92