Inventor
INOUE MARI
JP4 patents
Patents
4 patentsUS7295304B2Nov 13, 2007
Mask defect inspecting method, semiconductor device manufacturing method, mask defect inspecting apparatus, defect influence map generating method, and computer program product
TOSHIBA KK12 citations83
US7185311B2Feb 27, 2007
Mask evaluating method, mask evaluating system, method of manufacturing mask and computer program product
TOSHIBA KK4 citations57
US6689625B2Feb 10, 2004
Method for correcting a design data of a layout pattern of a photomask, photomask manufactured by said method, and semiconductor device method using said photomask
TOSHIBA KK2 citations57
US7821628B2Oct 26, 2010
Mask defect inspection computer program product
TOSHIBA KK1 citations51