P

Inventor

ARAKAWA ATSUTOSHI

JP19 patents
⚠️ This page may combine multiple inventors who share the name “ARAKAWA ATSUTOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NIPPON MINING CO

7 patents
US7358159B2Apr 15, 2008

Method for manufacturing ZnTe compound semiconductor single crystal ZnTe compound semiconductor single crystal, and semiconductor device

NIPPON MINING CO6 citations73
US7696073B2Apr 13, 2010

Method of co-doping group 14 (4B) elements to produce ZnTe system compound semiconductor single crystal

NIPPON MINING CO0 citations51
US7629625B2Dec 8, 2009

Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device

NIPPON MINING CO0 citations51
US7544343B2Jun 9, 2009

CdTe system compound semiconductor single crystal

NIPPON MINING CO0 citations51
US7521282B2Apr 21, 2009

Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device

NIPPON MINING CO0 citations51
US7517720B2Apr 14, 2009

Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device

NIPPON MINING CO0 citations51
US7229494B2Jun 12, 2007

Production method for compound semiconductor single crystal

NIPPON MINING CO1 citations51

JX NIPPON MINING & METALS CORP

5 patents
US10724134B2Jul 28, 2020

Magnetic material sputtering target and method for producing same

JX NIPPON MINING & METALS CORP1 citations61
US10644230B2May 5, 2020

Magnetic material sputtering target and method for producing same

JX NIPPON MINING & METALS CORP1 citations61
US9773653B2Sep 26, 2017

Ferromagnetic material sputtering target containing chromium oxide

JX NIPPON MINING & METALS CORP0 citations51
US9761422B2Sep 12, 2017

Magnetic material sputtering target and manufacturing method for same

JX NIPPON MINING & METALS CORP1 citations51
US9732414B2Aug 15, 2017

Co—Cr—Pt-based sputtering target and method for producing same

JX NIPPON MINING & METALS CORP0 citations51

OGINO SHIN-ICHI

2 patents
US8679268B2Mar 25, 2014

Sputtering target of ferromagnetic material with low generation of particles

OGINO SHIN-ICHI6 citations82
US9181617B2Nov 10, 2015

Sputtering target of ferromagnetic material with low generation of particles

OGINO SHIN-ICHI2 citations61

ARAKAWA ATSUTOSHI

2 patents
US9269389B2Feb 23, 2016

Sputtering target of magnetic material

ARAKAWA ATSUTOSHI5 citations68
US8758476B2Jun 24, 2014

Method of producing mixed powder comprising noble metal powder and oxide powder, and mixed powder comprising noble metal powder and oxide powder

ARAKAWA ATSUTOSHI0 citations48

JAPAN ENERGY CORP

1 patent
US6791257B1Sep 14, 2004

Photoelectric conversion functional element and production method thereof

JAPAN ENERGY CORP105 citations97

SATO ATSUSHI

1 patent
US9228251B2Jan 5, 2016

Ferromagnetic material sputtering target

SATO ATSUSHI0 citations41

NIKKO MATERIALS CO LTD

1 patent
US6989059B2Jan 24, 2006

Process for producing single crystal of compound semiconductor and crystal growing apparatus

NIKKO MATERIALS CO LTD0 citations41