Inventor
FRIEDMANN MICHAEL
US36 patents
⚠️ This page may combine multiple inventors who share the name “FRIEDMANN MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR TECH CORP
14 patentsUS7317531B2Jan 8, 2008
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP83 citations98
US7242477B2Jul 10, 2007
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP124 citations98
US7433040B2Oct 7, 2008
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP28 citations96
US7385699B2Jun 10, 2008
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP34 citations96
US7301634B2Nov 27, 2007
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP35 citations96
US7298481B2Nov 20, 2007
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP46 citations96
US7289213B2Oct 30, 2007
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP49 citations96
US7280212B2Oct 9, 2007
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP45 citations96
US7933016B2Apr 26, 2011
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP15 citations92
US7876440B2Jan 25, 2011
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP13 citations92
US7663753B2Feb 16, 2010
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP19 citations92
US7564557B2Jul 21, 2009
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP19 citations92
US7379183B2May 27, 2008
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR TECH CORP18 citations92
US7277172B2Oct 2, 2007
Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals
KLA TENCOR TECH CORP34 citations92
KLA TENCOR CORP
12 patentsUS7656528B2Feb 2, 2010
Periodic patterns and technique to control misalignment between two layers
KLA TENCOR CORP60 citations97
US9476698B2Oct 25, 2016
Periodic patterns and technique to control misalignment between two layers
KLA TENCOR CORP22 citations92
US11333621B2May 17, 2022
Methods and systems for semiconductor metrology based on polychromatic soft X-Ray diffraction
KLA TENCOR CORP10 citations85
US10451412B2Oct 22, 2019
Apparatus and methods for detecting overlay errors using scatterometry
KLA TENCOR CORP7 citations84
US10859518B2Dec 8, 2020
X-ray zoom lens for small angle x-ray scatterometry
KLA TENCOR CORP5 citations72
US10365211B2Jul 30, 2019
Systems and methods for metrology beam stabilization
KLA TENCOR CORP6 citations72
US10663392B2May 26, 2020
Variable aperture mask
KLA TENCOR CORP1 citations60
US10151584B2Dec 11, 2018
Periodic patterns and technique to control misalignment between two layers
KLA TENCOR CORP0 citations51
US9835447B2Dec 5, 2017
Periodic patterns and technique to control misalignment between two layers
KLA TENCOR CORP0 citations51
US9234745B2Jan 12, 2016
Periodic patterns and techniques to control misalignment between two layers
KLA TENCOR CORP0 citations51
US9103662B2Aug 11, 2015
Periodic patterns and technique to control misalignment between two layers
KLA TENCOR CORP0 citations51
US10804167B2Oct 13, 2020
Methods and systems for co-located metrology
KLA TENCOR CORP0 citations40
KLA CORP
6 patentsUS11557462B2Jan 17, 2023
Collecting and recycling rare gases in semiconductor processing equipment
KLA CORP0 citations61
US11268901B2Mar 8, 2022
Variable aperture mask
KLA CORP0 citations60
US11121521B2Sep 14, 2021
System and method for pumping laser sustained plasma with interlaced pulsed illumination sources
KLA CORP1 citations58
US11259394B2Feb 22, 2022
Laser produced plasma illuminator with liquid sheet jet target
KLA CORP0 citations57
US12013355B2Jun 18, 2024
Methods and systems for compact, small spot size soft x-ray scatterometry
KLA CORP0 citations50
US11272607B2Mar 8, 2022
Laser produced plasma illuminator with low atomic number cryogenic target
KLA CORP0 citations47