Inventor
NARITA MASAKI
JP32 patents
⚠️ This page may combine multiple inventors who share the name “NARITA MASAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
18 patentsUS6025117AFeb 15, 2000
Method of forming a pattern using polysilane
TOSHIBA KK423 citations98
US5444207AAug 22, 1995
Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field
TOSHIBA KK132 citations98
US5660744AAug 26, 1997
Plasma generating apparatus and surface processing apparatus
TOSHIBA KK65 citations96
US6383942B1May 7, 2002
Dry etching method
TOSHIBA KK27 citations93
US6274507B1Aug 14, 2001
Plasma processing apparatus and method
TOSHIBA KK33 citations92
US6270948B1Aug 7, 2001
Method of forming pattern
TOSHIBA KK54 citations92
US7732338B2Jun 8, 2010
Method of fabricating semiconductor device with reduced pitch
TOSHIBA KK10 citations84
US6333246B1Dec 25, 2001
Semiconductor device manufacturing method using electrostatic chuck and semiconductor device manufacturing system
TOSHIBA KK18 citations82
US6376347B1Apr 23, 2002
Method of making gate wiring layer over semiconductor substrate
TOSHIBA KK17 citations77
US6911398B2Jun 28, 2005
Method of sequentially processing a plurality of lots each including semiconductor substrates
TOSHIBA KK10 citations74
US5879863AMar 9, 1999
Pattern forming method
TOSHIBA KK12 citations74
US6685797B2Feb 3, 2004
Semiconductor device manufacturing system for etching a semiconductor by plasma discharge
TOSHIBA KK10 citations72
US6887802B2May 3, 2005
Method of manufacturing semiconductor device and semiconductor device
TOSHIBA KK3 citations63
US6313535B1Nov 6, 2001
Wiring layer of a semiconductor integrated circuit
TOSHIBA KK3 citations62
US6368977B1Apr 9, 2002
Semiconductor device manufacturing method
TOSHIBA KK3 citations60
US7067761B2Jun 27, 2006
Semiconductor device manufacturing system for etching a semiconductor by plasma discharge
TOSHIBA KK0 citations51
US6989073B2Jan 24, 2006
Semiconductor device manufacturing system for etching a semiconductor by plasma discharge
TOSHIBA KK0 citations51
US7208400B2Apr 24, 2007
Method of manufacturing a semiconductor device including a dielectric film formed between first and second electrode layers
TOSHIBA KK0 citations42
RICOH KK
7 patentsUS5786594AJul 28, 1998
Multi-beam pitch adjustment system and method
RICOH KK136 citations98
US5753907AMay 19, 1998
Multiple beam scanning apparatus
RICOH KK64 citations96
US5926203AJul 20, 1999
Image recording method and apparatus using multiple laser beams
RICOH KK30 citations92
US5610724AMar 11, 1997
Image forming system
RICOH KK30 citations92
US4912563AMar 27, 1990
Electrophotographic image forming apparatus having replaceable optical unit
RICOH KK49 citations92
US6560414B2May 6, 2003
Reusable photoreceptor and image forming apparatus using the reusable photoreceptor and method of reusing photoreceptor
RICOH KK39 citations91
US6763208B2Jul 13, 2004
Photoreceptor regenerating apparatus and image forming apparatus using regenerated photoreceptor and method of regenerating photoreceptor
RICOH KK15 citations82
SUZUKI MOTOR CO
4 patentsUS6014963AJan 18, 2000
Method and apparatus for controlling the air-fuel ratio in an internal combustion engine
SUZUKI MOTOR CO35 citations92
US5460143AOct 24, 1995
Fault-diagnosing device for evaporation system
SUZUKI MOTOR CO36 citations92
US5337725AAug 16, 1994
Self-diagnostic apparatus for exhaust gas recirculating apparatus
SUZUKI MOTOR CO28 citations92
US5411007AMay 2, 1995
Air-fuel ratio control apparatus of internal combustion engine
SUZUKI MOTOR CO9 citations74