Inventor
OMARJEE VINCENT M
FR17 patents
⚠️ This page may combine multiple inventors who share the name “OMARJEE VINCENT M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
AIR LIQUIDE AMERICAN
7 patentsUS11152223B2Oct 19, 2021
Fluorocarbon molecules for high aspect ratio oxide etch
AIR LIQUIDE AMERICAN1 citations73
US10103031B2Oct 16, 2018
Chemistries for TSV/MEMS/power device etching
AIR LIQUIDE AMERICAN2 citations73
US9892932B2Feb 13, 2018
Chemistries for TSV/MEMS/power device etching
AIR LIQUIDE AMERICAN3 citations73
US11430663B2Aug 30, 2022
Iodine-containing compounds for etching semiconductor structures
AIR LIQUIDE AMERICAN3 citations72
US10607850B2Mar 31, 2020
Iodine-containing compounds for etching semiconductor structures
AIR LIQUIDE AMERICAN4 citations72
US10720335B2Jul 21, 2020
Chemistries for TSV/MEMS/power device etching
AIR LIQUIDE AMERICAN0 citations52
US10381240B2Aug 13, 2019
Fluorocarbon molecules for high aspect ratio oxide etch
AIR LIQUIDE AMERICAN0 citations52
AIR LIQUIDE
4 patentsUS9514959B2Dec 6, 2016
Fluorocarbon molecules for high aspect ratio oxide etch
AIR LIQUIDE14 citations92
US8343860B1Jan 1, 2013
High C content molecules for C implant
AIR LIQUIDE8 citations84
US8367531B1Feb 5, 2013
Aluminum implant using new compounds
AIR LIQUIDE5 citations73
US8349738B2Jan 8, 2013
Metal precursors for deposition of metal-containing films
AIR LIQUIDE1 citations51
DUSSARRAT CHRISTIAN
4 patentsUS8765220B2Jul 1, 2014
Methods of making and deposition methods using hafnium- or zirconium-containing compounds
DUSSARRAT CHRISTIAN2 citations62
US9045509B2Jun 2, 2015
Hafnium- and zirconium-containing precursors and methods of using the same
DUSSARRAT CHRISTIAN1 citations51
US8076243B2Dec 13, 2011
Metal precursors for deposition of metal-containing films
DUSSARRAT CHRISTIAN0 citations51
US9121093B2Sep 1, 2015
Bis-ketoiminate copper precursors for deposition of copper-containing films and methods thereof
DUSSARRAT CHRISTIAN0 citations40