Inventor
KWOK AMY M
US8 patents
Patents
8 patentsUS7605439B2Oct 20, 2009
Antireflective hard mask compositions
ROHM & HAAS ELECT MAT8 citations82
US10162265B2Dec 25, 2018
Pattern treatment methods
ROHM & HAAS ELECT MAT2 citations72
US9557642B2Jan 31, 2017
Photoresist composition and associated method of forming an electronic device
ROHM & HAAS ELECT MAT5 citations72
US9551930B2Jan 24, 2017
Photoresist composition and associated method of forming an electronic device
ROHM & HAAS ELECT MAT3 citations72
US9527936B2Dec 27, 2016
Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method
ROHM & HAAS ELECT MAT2 citations62
US11829069B2Nov 28, 2023
Photoresist compositions and methods
ROHM & HAAS ELECT MAT1 citations59
US9606434B2Mar 28, 2017
Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method
ROHM & HAAS ELECT MAT1 citations51
US8373241B2Feb 12, 2013
Antireflective hard mask compositions
ROHM & HAAS ELECT MAT0 citations50