Inventor
WANG QUNHUA
US21 patents
⚠️ This page may combine multiple inventors who share the name “WANG QUNHUA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
13 patentsUS7785672B2Aug 31, 2010
Method of controlling the film properties of PECVD-deposited thin films
APPLIED MATERIALS INC247 citations99
US7125758B2Oct 24, 2006
Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursors
APPLIED MATERIALS INC47 citations92
US10262837B2Apr 16, 2019
Plasma uniformity control by gas diffuser hole design
APPLIED MATERIALS INC5 citations84
US7501161B2Mar 10, 2009
Methods and apparatus for reducing arcing during plasma processing
APPLIED MATERIALS INC13 citations80
US6960263B2Nov 1, 2005
Shadow frame with cross beam for semiconductor equipment
APPLIED MATERIALS INC10 citations74
US10312058B2Jun 4, 2019
Plasma uniformity control by gas diffuser hole design
APPLIED MATERIALS INC3 citations73
US10087524B2Oct 2, 2018
Showerhead support structure for improved gas flow
APPLIED MATERIALS INC5 citations73
US9818606B2Nov 14, 2017
Amorphous silicon thickness uniformity improved by process diluted with hydrogen and argon gas mixture
APPLIED MATERIALS INC4 citations73
US9299558B2Mar 29, 2016
Run-to-run stability of film deposition
APPLIED MATERIALS INC3 citations73
US11773489B2Oct 3, 2023
Gas confiner assembly for eliminating shadow frame
APPLIED MATERIALS INC0 citations52
US10697063B2Jun 30, 2020
Corner spoiler for improving profile uniformity
APPLIED MATERIALS INC0 citations52
US9048099B2Jun 2, 2015
Multi-layer amorphous silicon structure with improved poly-silicon quality after excimer laser anneal
APPLIED MATERIALS INC0 citations52
US8002896B2Aug 23, 2011
Shadow frame with cross beam for semiconductor equipment
APPLIED MATERIALS INC1 citations52
WANG QUNHUA
4 patentsUSD664249SJul 24, 2012
Flow blocker plate
WANG QUNHUA21 citations91
USD1064407SFeb 25, 2025
Hair removal device
WANG QUNHUA6 citations85
US9287137B2Mar 15, 2016
Methods for depositing a silicon containing layer with argon gas dilution
WANG QUNHUA2 citations62
US10676817B2Jun 9, 2020
Flip edge shadow frame
WANG QUNHUA0 citations41