Inventor
CAPELLI RENZO
DE12 patents
Patents
12 patentsUS10055833B2Aug 21, 2018
Method and system for EUV mask blank buried defect analysis
ZEISS CARL SMT GMBH2 citations66
US11796926B2Oct 24, 2023
Metrology system for examining objects with EUV measurement light
ZEISS CARL SMT GMBH0 citations59
US11774848B2Oct 3, 2023
Method and apparatus for repairing defects of a photolithographic mask for the EUV range
ZEISS CARL SMT GMBH0 citations53
US11079673B2Aug 3, 2021
Method and apparatus for repairing defects of a photolithographic mask for the EUV range
ZEISS CARL SMT GMBH0 citations53
US12174546B2Dec 24, 2024
Method for measuring an effect of a wavelength-dependent measuring light reflectivity and an effect of a polarization of measuring light on a measuring light impingement on a lithography mask
ZEISS CARL SMT GMBH0 citations49
US11061331B2Jul 13, 2021
Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth
ZEISS CARL SMT GMBH0 citations48
US10564551B2Feb 18, 2020
Method for determining a focus position of a lithography mask and metrology system for carrying out such a method
ZEISS CARL SMT GMBH0 citations48
US12422743B2Sep 23, 2025
Method for measuring a reflectivity of an object for measurement light and metrology system for carrying out the method
ZEISS CARL SMT GMBH0 citations47
US12372431B2Jul 29, 2025
Method for determining an imaging quality of an optical system when illuminated by illumination light within a pupil to be measured
ZEISS CARL SMT GMBH0 citations46
US12288272B2Apr 29, 2025
Method for determining a production aerial image of an object to be measured
ZEISS CARL SMT GMBH0 citations45
US10775691B2Sep 15, 2020
Method for examining photolithographic masks and mask metrology apparatus for performing the method
ZEISS CARL SMT GMBH0 citations39
US10481505B2Nov 19, 2019
Method for determining an imaging aberration contribution of an imaging optical unit for measuring lithography masks
ZEISS CARL SMT GMBH0 citations37