Inventor

BECKER DAVID S

US43 patents

⚠️ This page may combine multiple inventors who share the name “BECKER DAVID S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BECKER DAVID S

MICRON TECHNOLOGY INC

Gas pulsing for etch profile control

Method for enhancing silicon dioxide to silicon nitride selectivity

Process for selectively etching a layer of silicon dioxide on an underlying stop layer of silicon nitride

Method of forming high aspect ratio apertures

Etchant and method of use

Semiconductor structure useful in a self-aligned contact etch and method for making same

Plasma etching methods

Method of forming high aspect ratio apertures

Semiconductor structure useful in a self-aligned contact having multiple insulation layers of non-uniform thickness

In situ etch process for insulating and conductive materials

Method for enhancing oxide to nitride selectivity through the use of independent heat control

Semiconductor processing methods of forming a contact opening to a semiconductor substrate

Process for forming a diffusion barrier using an insulating spacer layer

In situ etch process for insulating and conductive materials

Method of reducing overetch during the formation of a semiconductor device

One chamber in-situ etch process for oxide and conductive material

Method of etching a substrate

Self-aligned contact formation for semiconductor devices

Method for enhancing oxide to nitride selectivity through the use of independent heat control

Method of forming high aspect ratio apertures

Etchant and method of use

Method of forming high aspect ratio apertures

Plasma etching methods

Fuse structures

Self-aligned contact formation for semiconductor devices

Method of reducing overetch during the formation of a semiconductor device

Semiconductor processing methods of forming a contact opening to a semiconductor substrate

Methods for etching fuse openings in a semiconductor device

Highly selective nitride spacer etch

Method of reducing overetch during the formation of a semiconductor device

Highly selective nitride spacer etch

Method of reducing overetch during the formation of a semiconductor device

Plasma etching methods

Method of reducing overetch during the formation of a semiconductor device

Semiconductor structure useful in a self-aligned contact etch and method for making same

Methods for etching fuse openings in a semiconductor device

Method of forming high aspect ratio apertures

Plasma etching methods

Plasma etching methods

MICRON SEMICONDUCTOR INC

Method of conductor isolation from a conductive contact plug

MELHORN J MICHAEL

Poultry cart handler and method

MICRON TECHNOLOGY LNC

Method of reducing overetch during the formation of a semiconductor device

EIG SERVICES INC

Digital platform for connecting insurance related transactions