Inventor
Reddy Kapu Sirish
US18 patents
Patents
18 patentsUS9847221B1Dec 19, 2017
Low temperature formation of high quality silicon oxide films in semiconductor device manufacturing
LAM RES CORP389 citations97
US10665501B2May 26, 2020
Deposition of Aluminum oxide etch stop layers
LAM RES CORP22 citations93
US9859153B1Jan 2, 2018
Deposition of aluminum oxide etch stop layers
LAM RES CORP19 citations93
US10559461B2Feb 11, 2020
Selective deposition with atomic layer etch reset
LAM RES CORP10 citations83
US10566194B2Feb 18, 2020
Selective deposition of etch-stop layer for enhanced patterning
LAM RES CORP5 citations82
US10998187B2May 4, 2021
Selective deposition with atomic layer etch reset
LAM RES CORP2 citations72
US10418236B2Sep 17, 2019
Composite dielectric interface layers for interconnect structures
LAM RES CORP3 citations72
US10049869B2Aug 14, 2018
Composite dielectric interface layers for interconnect structures
LAM RES CORP4 citations72
US11094542B2Aug 17, 2021
Selective deposition of etch-stop layer for enhanced patterning
LAM RES CORP2 citations71
US10643889B2May 5, 2020
Pre-treatment method to improve selectivity in a selective deposition process
LAM RES CORP2 citations71
US10472716B1Nov 12, 2019
Showerhead with air-gapped plenums and overhead isolation gas distributor
LAM RES CORP4 citations69
US12266535B2Apr 1, 2025
Mask encapsulation to prevent degradation during fabrication of high aspect ratio features
LAM RES CORP1 citations62
US11869770B2Jan 9, 2024
Selective deposition of etch-stop layer for enhanced patterning
LAM RES CORP0 citations60
US12249514B2Mar 11, 2025
Carbon based depositions used for critical dimension control during high aspect ratio feature etches and for forming protective layers
LAM RES CORP0 citations57
US12588475B2Mar 24, 2026
High selectivity doped hardmask films
LAM RES CORP0 citations56
US10804144B2Oct 13, 2020
Deposition of aluminum oxide etch stop layers
LAM RES CORP0 citations51
US10745806B2Aug 18, 2020
Showerhead with air-gapped plenums and overhead isolation gas distributor
LAM RES CORP0 citations48
US10651080B2May 12, 2020
Oxidizing treatment of aluminum nitride films in semiconductor device manufacturing
LAM RES CORP0 citations39