Inventor
BENSCHOP JOZEF PETRUS HENRICUS
NL28 patents
⚠️ This page may combine multiple inventors who share the name “BENSCHOP JOZEF PETRUS HENRICUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
16 patentsUS7161659B2Jan 9, 2007
Dual stage lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV271 citations98
US10228615B2Mar 12, 2019
Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane
ASML NETHERLANDS BV17 citations93
US9335638B2May 10, 2016
Lithographic apparatus, programmable patterning device and lithographic method
ASML NETHERLANDS BV19 citations92
US10698312B2Jun 30, 2020
Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane
ASML NETHERLANDS BV8 citations82
US7760324B2Jul 20, 2010
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV19 citations82
US6999161B2Feb 14, 2006
Lithographic apparatus, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV8 citations74
US7173687B2Feb 6, 2007
Lithographic apparatus, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV2 citations63
US7110087B2Sep 19, 2006
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV2 citations63
USRE45576EJun 23, 2015
Dual stage lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV1 citations62
US12500063B2Dec 16, 2025
Method and apparatus for inspection
ASML NETHERLANDS BV0 citations61
US11875966B2Jan 16, 2024
Method and apparatus for inspection
ASML NETHERLANDS BV0 citations61
US11094502B2Aug 17, 2021
Method and apparatus for inspection
ASML NETHERLANDS BV0 citations61
US6597431B2Jul 22, 2003
Lithographic projection apparatus and device manufacturing method
ASML NETHERLANDS BV4 citations60
USRE47943EApr 14, 2020
Dual stage lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations52
USRE46933EJul 3, 2018
Dual stage lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations52
US7394524B2Jul 1, 2008
Lithographic apparatus, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV0 citations52
DEN BOEF ARIE JEFFREY
2 patentsVAN DEN BRINK MARINUS AART
2 patentsZEISS CARL SMT GMBH
2 patentsUS11194256B2Dec 7, 2021
Optical diffraction component for suppressing at least one target wavelength by destructive interference
ZEISS CARL SMT GMBH5 citations81
US10852640B2Dec 1, 2020
Optical diffraction component for suppressing at least one target wavelength by destructive interference
ZEISS CARL SMT GMBH2 citations70