Inventor
KUBO MINORU
JP41 patents
⚠️ This page may combine multiple inventors who share the name “KUBO MINORU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD
40 patentsUS6399970B2Jun 4, 2002
FET having a Si/SiGeC heterojunction channel
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD279 citations99
US6190975B1Feb 20, 2001
Method of forming HCMOS devices with a silicon-germanium-carbon compound semiconductor layer
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD230 citations99
US6852602B2Feb 8, 2005
Semiconductor crystal film and method for preparation thereof
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD103 citations98
US6844227B2Jan 18, 2005
Semiconductor devices and method for manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD48 citations96
US6674100B2Jan 6, 2004
SiGeC-based CMOSFET with separate heterojunctions
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD58 citations96
US6597016B1Jul 22, 2003
Semiconductor device and method for fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD53 citations96
US5751013AMay 12, 1998
Semiconductor light-emitting device and production method thereof
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD72 citations96
US6759697B2Jul 6, 2004
Heterojunction bipolar transistor
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD24 citations93
US6277657B1Aug 21, 2001
Apparatus for fabricating semiconductor device and fabrication method therefor
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD20 citations93
US6136626AOct 24, 2000
Semiconductor light-emitting device and production method thereof
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD34 citations93
US6133058AOct 17, 2000
Fabrication of semiconductor light-emitting device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD27 citations93
US5895225AApr 20, 1999
Semiconductor light-emitting device and production method thereof
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD25 citations93
US6965107B2Nov 15, 2005
Semiconductor-based encapsulated infrared sensor and electronic device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD31 citations92
US6890834B2May 10, 2005
Electronic device and method for manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD28 citations92
US6645836B2Nov 11, 2003
Method of forming a semiconductor wafer having a crystalline layer thereon containing silicon, germanium and carbon
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD25 citations92
US6537369B1Mar 25, 2003
SiGeC semiconductor crystal and production method thereof
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD24 citations92
US6403976B1Jun 11, 2002
Semiconductor crystal, fabrication method thereof, and semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD37 citations92
US5705831AJan 6, 1998
Semiconductor light-emitting device and production method thereof, and crystal-growing method suitable for the production method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD19 citations92
US4885260ADec 5, 1989
Method of laser enhanced vapor phase growth for compound semiconductor
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD31 citations89
US6815735B2Nov 9, 2004
Semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD16 citations84
US6620665B1Sep 16, 2003
Method for fabricating semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD13 citations84
US5863834AJan 26, 1999
Semiconductor device and method of manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD18 citations83
US7244972B2Jul 17, 2007
Semiconductor devices and method for manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD7 citations74
US7170110B2Jan 30, 2007
Semiconductor device and method for fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD9 citations74
US7105449B1Sep 12, 2006
Method for cleaning substrate and method for producing semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD8 citations74
US6872989B2Mar 29, 2005
Semiconductor device and method for fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD7 citations74
US6756278B2Jun 29, 2004
Lateral heterojunction bipolar transistor and method of fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD12 citations74
US6720587B2Apr 13, 2004
Structure evaluation method, method for manufacturing semiconductor devices, and recording medium
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD7 citations74
US6660393B2Dec 9, 2003
SiGeC semiconductor crystals and the method producing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD6 citations74
US6563146B1May 13, 2003
Lateral heterojunction bipolar transistor and method of fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD9 citations74
US5619520AApr 8, 1997
Semiconductor laser
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD16 citations74
US5274248ADec 28, 1993
Light-emitting device with II-VI compounds
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD15 citations73
US5120393AJun 9, 1992
Method for molecular-beam epitaxial growth
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD13 citations73
US7135721B2Nov 14, 2006
Heterojunction bipolar transistor having reduced driving voltage requirements
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD3 citations63
US6649496B2Nov 18, 2003
Production method for semiconductor crystal
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD4 citations63
US5372970ADec 13, 1994
Method for epitaxially growing a II-VI compound semiconductor
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD5 citations63
US6919253B2Jul 19, 2005
Method of forming a semiconductor device including simultaneously forming a single crystalline epitaxial layer and a polycrystalline or amorphous layer
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations62
US7049198B2May 23, 2006
Semiconductor device and method for fabricating the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD0 citations52
US6930026B2Aug 16, 2005
Method of forming a semiconductor wafer having a crystalline layer thereon containing silicon, germanium and carbon
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1 citations52
US4702781AOct 27, 1987
Liquid phase epitaxial growth method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1 citations52