P

Inventor

YAMADA AKIO

JP131 patents
⚠️ This page may combine multiple inventors who share the name “YAMADA AKIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUJITSU LTD

25 patents
US5260579ANov 9, 1993

Charged particle beam exposure system and charged particle beam exposure method

FUJITSU LTD167 citations99
US6222195B1Apr 24, 2001

Charged-particle-beam exposure device and charged-particle-beam exposure method

FUJITSU LTD49 citations96
US5854490ADec 29, 1998

Charged-particle-beam exposure device and charged-particle-beam exposure method

FUJITSU LTD46 citations96
US5841145ANov 24, 1998

Method of and system for exposing pattern on object by charged particle beam

FUJITSU LTD60 citations96
US5173582ADec 22, 1992

Charged particle beam lithography system and method

FUJITSU LTD63 citations96
US5105089AApr 14, 1992

Electron beam exposure system

FUJITSU LTD25 citations93
US5051556ASep 24, 1991

Charged particle beam lithography system and a method thereof

FUJITSU LTD43 citations93
US5041731AAug 20, 1991

Deflection compensating device for converging lens

FUJITSU LTD24 citations93
US6137111AOct 24, 2000

Charged particle-beam exposure device and charged-particle-beam exposure method

FUJITSU LTD26 citations92
US5981960ANov 9, 1999

Charged particle beam exposure method and apparatus therefor

FUJITSU LTD36 citations92
US5892237AApr 6, 1999

Charged particle beam exposure method and apparatus

FUJITSU LTD28 citations92
US5830612ANov 3, 1998

Method of detecting a deficiency in a charged-particle-beam exposure mask

FUJITSU LTD28 citations92
US5719402AFeb 17, 1998

Method of and system for charged particle beam exposure

FUJITSU LTD32 citations92
US5546319AAug 13, 1996

Method of and system for charged particle beam exposure

FUJITSU LTD21 citations92
US5404018AApr 4, 1995

Method of and an apparatus for charged particle beam exposure

FUJITSU LTD22 citations92
US5391886AFeb 21, 1995

Charged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure system

FUJITSU LTD36 citations92
US5304811AApr 19, 1994

Lithography system using charged-particle beam and method of using the same

FUJITSU LTD23 citations92
US5965895AOct 12, 1999

Method of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposure

FUJITSU LTD13 citations82
US5721432AFeb 24, 1998

Method of and system for charged particle beam exposure

FUJITSU LTD16 citations82
US4954717ASep 4, 1990

Photoelectron mask and photo cathode image projection method using the same

FUJITSU LTD21 citations81
US5949078ASep 7, 1999

Charged-particle-beam exposure device and charged-particle-beam exposure method

FUJITSU LTD16 citations80
US5849436ADec 15, 1998

Block mask and charged particle beam exposure method and apparatus using the same

FUJITSU LTD15 citations74
US5608226AMar 4, 1997

Electron-beam exposure method and system

FUJITSU LTD17 citations74
US5466549ANov 14, 1995

Method of detecting and adjusting exposure conditions of charged particle exposure system

FUJITSU LTD13 citations74
US5449915ASep 12, 1995

Electron beam exposure system capable of detecting failure of exposure

FUJITSU LTD17 citations74

DDK LTD

11 patents

MORINAGA MILK INDUSTRY CO LTD

2 patents

NEC CORP

1 patent

NIHON KOHDEN CORP

1 patent

HOSPAL AG

1 patent

(unassigned)

1 patent

YAMADA MACHINERY IND CO LTD

1 patent

NOMURA TOSHIYUKI

1 patent

ISHIKAWA MASUMI

1 patent

BUNKER RAMO

1 patent

Webasto SE

1 patent

TAKAGI MASAMICHI

1 patent

ISHIKAWAJIMA HARIMA HEAVY IND

1 patent

ADVANTEST CORP

1 patent

Showing the top 50 of 131 patents by PatentIndex Score.