Inventor
BYERS ERIK
US19 patents
⚠️ This page may combine multiple inventors who share the name “BYERS ERIK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
16 patentsUS8748321B2Jun 10, 2014
Method for epitaxial devices
MICRON TECHNOLOGY INC5 citations84
US6486956B2Nov 26, 2002
Reducing asymmetrically deposited film induced registration error
MICRON TECHNOLOGY INC13 citations81
US7127319B2Oct 24, 2006
Reducing asymmetrically deposited film induced registration error
MICRON TECHNOLOGY INC8 citations73
US9385276B2Jul 5, 2016
Epitaxial devices
MICRON TECHNOLOGY INC1 citations63
US9112104B2Aug 18, 2015
Epitaxial devices
MICRON TECHNOLOGY INC2 citations63
US7446855B2Nov 4, 2008
Methods and apparatuses for configuring radiation in microlithographic processing of workpieces using an adjustment structure
MICRON TECHNOLOGY INC2 citations62
US6852456B2Feb 8, 2005
Reducing asymmetrically deposited film induced registration error
MICRON TECHNOLOGY INC2 citations62
US6854106B2Feb 8, 2005
Reticles and methods of forming and using the same
MICRON TECHNOLOGY INC3 citations61
US11329062B2May 10, 2022
Memory arrays and methods used in forming a memory array
MICRON TECHNOLOGY INC1 citations60
US7144690B2Dec 5, 2006
Photolithographic methods of using a single reticle to form overlapping patterns
MICRON TECHNOLOGY INC4 citations59
US9842965B2Dec 12, 2017
Textured devices
MICRON TECHNOLOGY INC0 citations52
US7229724B2Jun 12, 2007
Reticles and methods of forming and using the same
MICRON TECHNOLOGY INC0 citations51
US6795747B2Sep 21, 2004
Reducing asymmetrically deposited film induced registration error
MICRON TECHNOLOGY INC0 citations51
US6670109B2Dec 30, 2003
Photolithographic methods of using a single reticle to form overlapping patterns
MICRON TECHNOLOGY INC1 citations48
US6653241B2Nov 25, 2003
Methods of forming protective segments of material, and etch stops
MICRON TECHNOLOGY INC0 citations48
US6620734B1Sep 16, 2003
Methods of forming protective segments of material, and etch stops
MICRON TECHNOLOGY INC0 citations48