Inventor
BOWES STEVE W
US15 patents
Patents
15 patentsUS6778275B2Aug 17, 2004
Aberration mark and method for estimating overlay error and optical aberrations
MICRON TECHNOLOGY INC126 citations98
US6861367B2Mar 1, 2005
Semiconductor processing method using photoresist and an antireflective coating
MICRON TECHNOLOGY INC32 citations92
US6730444B2May 4, 2004
Needle comb reticle pattern for critical dimension and registration measurements using a registration tool and methods for using same
MICRON TECHNOLOGY INC43 citations92
US6545829B1Apr 8, 2003
Method and device for improved lithographic critical dimension control
MICRON TECHNOLOGY INC18 citations92
US6465141B2Oct 15, 2002
Method for improved lithographic critical dimension control
MICRON TECHNOLOGY INC21 citations92
US7064080B2Jun 20, 2006
Semiconductor processing method using photoresist and an antireflective coating
MICRON TECHNOLOGY INC11 citations84
US7463367B2Dec 9, 2008
Estimating overlay error and optical aberrations
MICRON TECHNOLOGY INC17 citations83
US7180189B2Feb 20, 2007
Abberation mark and method for estimating overlay error and optical abberations
MICRON TECHNOLOGY INC13 citations83
US6486956B2Nov 26, 2002
Reducing asymmetrically deposited film induced registration error
MICRON TECHNOLOGY INC13 citations81
US6538830B2Mar 25, 2003
Method and device for improved lithographic critical dimension control
MICRON TECHNOLOGY INC12 citations74
US7127319B2Oct 24, 2006
Reducing asymmetrically deposited film induced registration error
MICRON TECHNOLOGY INC8 citations73
US6990743B2Jan 31, 2006
Process for monitoring measuring device performance
MICRON TECHNOLOGY INC6 citations73
US6852456B2Feb 8, 2005
Reducing asymmetrically deposited film induced registration error
MICRON TECHNOLOGY INC2 citations62
US7200950B2Apr 10, 2007
Process for monitoring measuring device performance
MICRON TECHNOLOGY INC1 citations51
US6795747B2Sep 21, 2004
Reducing asymmetrically deposited film induced registration error
MICRON TECHNOLOGY INC0 citations51