Inventor
MULLEE WILLIAM H
US12 patents
⚠️ This page may combine multiple inventors who share the name “MULLEE WILLIAM H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
6 patentsUS6306564B1Oct 23, 2001
Removal of resist or residue from semiconductors using supercritical carbon dioxide
TOKYO ELECTRON LTD235 citations98
US6509141B2Jan 21, 2003
Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
TOKYO ELECTRON LTD101 citations97
US6500605B1Dec 31, 2002
Removal of photoresist and residue from substrate using supercritical carbon dioxide process
TOKYO ELECTRON LTD128 citations97
US6537916B2Mar 25, 2003
Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process
TOKYO ELECTRON LTD63 citations95
US6871656B2Mar 29, 2005
Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
TOKYO ELECTRON LTD46 citations92
US7064070B2Jun 20, 2006
Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process
TOKYO ELECTRON LTD17 citations83