Inventor

NI TUQIANG

US62 patents

⚠️ This page may combine multiple inventors who share the name “NI TUQIANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NI TUQIANG

LAM RES CORP

Configurable plasma volume etch chamber

System and method for controlling plasma with an adjustable coupling to ground circuit

High temperature tungsten etching process

Gas injection system for plasma processing

Plasma etching of dielectric layer with etch profile control

Elevated stationary uniformity ring design

Rapid IR transmission thermometry for wafer temperature sensing

Gas injection system for plasma processing

Gas injection system for plasma processing

Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same

Moveable barrier for multiple etch processes

Method for improving uniformity and reducing etch rate variation of etching polysilicon

Method of an apparatus for obtaining neutral dissociated gas atoms

Processing chamber with optical window cleaned using process gas

Integrated full wavelength spectrometer for wafer processing

Method of plasma etching organic antireflective coating

Integrated electronic hardware for wafer processing control and diagnostic

Method and system for detecting an exposure of a material on a semiconductor wafer during chemical-mechanical polishing

Etch endpoint detection

Vacuum plasma processor apparatus and method

Method and apparatus for side wall passivation for organic etch

Methods for detecting the endpoint of a photoresist stripping process

Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same

Apparatus for detecting the endpoint of a photoresist stripping process

Vacuum plasma processor method

ADVANCED MICRO FABRICATION EQUIPMENT INC CHINA

Plasma processor and processing method

Multi-zone temperature control plasma reactor

Liner assembly for vacuum treatment apparatus, and vacuum treatment apparatus

Plasma reactor and heating apparatus therefor

Lift pin assembly, an electrostatic chuck and a processing apparatus where the electrostatic chuck is located

Plasma treatment apparatus, lower electrode assembly and forming method thereof

Capacitively coupled plasma etching apparatus

Capacitively coupled plasma etching apparatus

Capacitively coupled plasma etching apparatus

ADVANCED MICRO FAB EQUIP INC

Multiple frequency plasma chamber, switchable RF system, and processes using same

Silicon carbide gas distribution plate and RF electrode for plasma etch chamber

Multi-station decoupled reactive ion etch chamber

Plasma processing method and plasma processing device

NI TUQIANG

System and method of sensing and removing residual charge from a processed wafer

Plasma processing method and apparatus with control of plasma excitation power

Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same

System and method for controlling plasma with an adjustable coupling to ground circuit

ADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI

Plasma reactor having a variable coupling of low frequency RF power to an annular electrode

Device of changing gas flow pattern and a wafer processing method and apparatus

Processing chamber, combination of processing chamber and loadlock, and system for processing substrates

ADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI

Performance enhancement of coating packaged ESC for semiconductor apparatus

ICP source design for plasma uniformity and efficiency enhancement

LAM CORP

Small volume process chamber with hot inner surfaces

CHEN AIHUA

Multi-station plasma reactor with multiple plasma regions

YIN GERALD

Capacitive CVD reactor and methods for plasma CVD process