Inventor

ULRICH BRUCE D

US30 patents

⚠️ This page may combine multiple inventors who share the name “ULRICH BRUCE D”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ULRICH BRUCE D

SHARP LAB OF AMERICA INC

One mask Pt/PCMO/Pt stack etching process for RRAM applications

Self-aligned shallow trench isolation process having improved polysilicon gate thickness control

Selective etching processes of silicon nitride and indium oxide thin films for FeRAM device applications

Method for forming an iridium oxide (IrOx) nanowire neural sensor array

Method of making a ferroelectric memory transistor

Method of fabricating an X/Y alignment vernier

X/Y alignment vernier formed on a substrate

Method of making self-aligned shallow trench isolation

Method of making MFMOS capacitors with high dielectric constant materials

Nanorod sensor with single-plane electrodes

Method of etching a TE/PCMO stack using an etch stop layer

Method of fabricating a grayscale mask using a wafer bonding process

Method of making a grayscale reticle using step-over lithography for shaping microlenses

Method of forming a microlens array having a high fill factor

Ultra-shallow metal oxide surface channel MOS transistor

Pt/PGO etching process for FeRAM applications

Method of etching a SiN/Ir/TaN or SiN/Ir/Ti stack using an aluminum hard mask

Selectively deposited PGO thin film and method for forming same

MOCVD selective deposition of c-axis oriented Pb5Ge3O11 thin films on high-k gate oxides

Error diffusion-derived sub-resolutional grayscale reticle

Sub-resolutional grayscale reticle

Method of fabricating grayscale mask using smart cut® wafer bonding process

MOCVD PGO thin films deposited on indium oxide for feram applications

Selective etching processes of SiO2 , Ti and In2 O3 thin films for FeRAM device applications

Integration processes for fabricating a conductive metal oxide gate ferroelectric memory transistor

Step-over lithography to produce parabolic photoresist profiles for microlens formation

Method for determining pattern misalignment over a substrate

MFMOS capacitors with high dielectric constant materials

GAO WEI

Semi-transparent film grayscale mask

SHARP LAB OF AMERICA

Grayscale reticle for precise control of photoresist exposure