Inventor
PATRICK INNA
US26 patents
⚠️ This page may combine multiple inventors who share the name “PATRICK INNA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
15 patentsUS7009227B2Mar 7, 2006
Photodiode structure and image pixel structure
MICRON TECHNOLOGY INC59 citations96
US6921934B2Jul 26, 2005
Double pinned photodiode for CMOS APS and method of formation
MICRON TECHNOLOGY INC47 citations96
US6897082B2May 24, 2005
Method of forming well for CMOS imager
MICRON TECHNOLOGY INC54 citations96
US7387908B2Jun 17, 2008
CMOS imager with enhanced transfer of charge and low voltage operation and method of formation
MICRON TECHNOLOGY INC14 citations92
US7153719B2Dec 26, 2006
Method of fabricating a storage gate pixel design
MICRON TECHNOLOGY INC21 citations92
US7078745B2Jul 18, 2006
CMOS imager with enhanced transfer of charge and low voltage operation
MICRON TECHNOLOGY INC18 citations92
US7768047B2Aug 3, 2010
Imager element, device and system with recessed transfer gate
MICRON TECHNOLOGY INC17 citations84
US7847366B2Dec 7, 2010
Well for CMOS imager
MICRON TECHNOLOGY INC7 citations74
US7635604B2Dec 22, 2009
Well for CMOS imager and method of formation
MICRON TECHNOLOGY INC4 citations74
US7511354B2Mar 31, 2009
Well for CMOS imager and method of formation
MICRON TECHNOLOGY INC4 citations74
US7420233B2Sep 2, 2008
Photodiode for improved transfer gate leakage
MICRON TECHNOLOGY INC8 citations74
US7385232B2Jun 10, 2008
CMOS imager with enhanced transfer of charge and low voltage operation and method of formation
MICRON TECHNOLOGY INC7 citations74
US7432121B2Oct 7, 2008
Isolation process and structure for CMOS imagers
MICRON TECHNOLOGY INC8 citations73
US7244646B2Jul 17, 2007
Pixel design to improve photodiode capacitance and method of forming same
MICRON TECHNOLOGY INC2 citations63
US7190041B2Mar 13, 2007
Well for CMOS imager
MICRON TECHNOLOGY INC1 citations63
APTINA IMAGING CORP
7 patentsUS7718459B2May 18, 2010
Dual conversion gain pixel using Schottky and ohmic contacts to the floating diffusion region and methods of fabrication and operation
APTINA IMAGING CORP8 citations84
US7749798B2Jul 6, 2010
Optimized photodiode process for improved transfer gate leakage
APTINA IMAGING CORP6 citations74
US7687832B2Mar 30, 2010
Method of fabricating a storage gate pixel design
APTINA IMAGING CORP7 citations74
US7495273B2Feb 24, 2009
Double pinned photodiode for CMOS APS and method of formation
APTINA IMAGING CORP6 citations74
US7829368B2Nov 9, 2010
Methods of forming double pinned photodiodes
APTINA IMAGING CORP1 citations63
US7510900B2Mar 31, 2009
Methods of forming a double pinned photodiode
APTINA IMAGING CORP1 citations63
US7704782B2Apr 27, 2010
Method of forming pixel cells with color specific characteristics
APTINA IMAGING CORP4 citations62