Inventor
KAWAGUCHI MARK N
US5 patents
Patents
5 patentsUS7604708B2Oct 20, 2009
Cleaning of native oxide with hydrogen-containing radicals
APPLIED MATERIALS INC226 citations97
US6991739B2Jan 31, 2006
Method of photoresist removal in the presence of a dielectric layer having a low k-value
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US7374696B2May 20, 2008
Method and apparatus for removing a halogen-containing residue
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US7846347B2Dec 7, 2010
Method for removing a halogen-containing residue
APPLIED MATERIALS INC0 citations51
US7648916B2Jan 19, 2010
Method and apparatus for performing hydrogen optical emission endpoint detection for photoresist strip and residue removal
APPLIED MATERIALS INC0 citations44