P

Inventor

FUJIWARA TAKAYUKI

JP112 patents
⚠️ This page may combine multiple inventors who share the name “FUJIWARA TAKAYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHINETSU CHEMICAL CO

28 patents
US11415887B2Aug 16, 2022

Resist composition and patterning process

SHINETSU CHEMICAL CO9 citations86
US10613437B2Apr 7, 2020

Resist composition and patterning process

SHINETSU CHEMICAL CO8 citations84
US10323113B2Jun 18, 2019

Resist composition and patterning process

SHINETSU CHEMICAL CO7 citations84
US10180626B2Jan 15, 2019

Sulfonium salt, resist composition, and patterning process

SHINETSU CHEMICAL CO9 citations84
US10173975B2Jan 8, 2019

Sulfonium compound, resist composition, and pattern forming process

SHINETSU CHEMICAL CO8 citations84
US9720323B2Aug 1, 2017

Chemically amplified positive resist composition and pattern forming process

SHINETSU CHEMICAL CO11 citations84
US11774853B2Oct 3, 2023

Resist composition and patterning process

SHINETSU CHEMICAL CO5 citations75
US11281101B2Mar 22, 2022

Resist composition and patterning process

SHINETSU CHEMICAL CO6 citations75
US11693314B2Jul 4, 2023

Resist composition and patterning process

SHINETSU CHEMICAL CO4 citations74
US11604411B2Mar 14, 2023

Resist composition and patterning process

SHINETSU CHEMICAL CO3 citations73
US11493843B2Nov 8, 2022

Resist composition and patterning process

SHINETSU CHEMICAL CO4 citations73
US11460773B2Oct 4, 2022

Resist composition and patterning process

SHINETSU CHEMICAL CO3 citations73
US11435665B2Sep 6, 2022

Resist composition and patterning process

SHINETSU CHEMICAL CO5 citations73
US11409194B2Aug 9, 2022

Resist composition and patterning process

SHINETSU CHEMICAL CO2 citations73
US11269253B2Mar 8, 2022

Resist composition and patterning process

SHINETSU CHEMICAL CO2 citations73
US11181823B2Nov 23, 2021

Resist composition and patterning process

SHINETSU CHEMICAL CO5 citations73
US11175580B2Nov 16, 2021

Resist composition and patterning process

SHINETSU CHEMICAL CO4 citations73
US10871711B2Dec 22, 2020

Resist composition and patterning process

SHINETSU CHEMICAL CO2 citations73
US10792489B2Oct 6, 2020

Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode

SHINETSU CHEMICAL CO4 citations73
US10734132B2Aug 4, 2020

Bio-electrode composition, bio-electrode, method for manufacturing the bio-electrode, and polymer compound

SHINETSU CHEMICAL CO3 citations73
US10726967B2Jul 28, 2020

Polymerizable monomer, polymer compound, biological electrode composition, biological electrode, and method for producing biological electrode

SHINETSU CHEMICAL CO2 citations73
US10695554B2Jun 30, 2020

Bio-electrode composition, bio-electrode, method for manufacturing the bio-electrode, and polymer

SHINETSU CHEMICAL CO2 citations73
US10054853B2Aug 21, 2018

Monomer, polymer, resist composition, and patterning process

SHINETSU CHEMICAL CO4 citations73
US9777093B2Oct 3, 2017

Polymer compound for a conductive polymer and method for producing same

SHINETSU CHEMICAL CO2 citations73
US9740098B2Aug 22, 2017

Chemically amplified negative resist composition using novel onium salt and resist pattern forming process

SHINETSU CHEMICAL CO5 citations73
US9703193B2Jul 11, 2017

Onium salt, resist composition, and patterning process

SHINETSU CHEMICAL CO2 citations73
US9645491B2May 9, 2017

Sulfonium salt, chemically amplified resist composition, and patterning process

SHINETSU CHEMICAL CO2 citations73
US9377689B2Jun 28, 2016

Silicone structure-bearing polymer, negative resist composition, photo-curable dry film, patterning process, and electric/electronic part-protecting film

SHINETSU CHEMICAL CO5 citations73

FUJI PHOTO FILM CO LTD

9 patents

AMADA CO LTD

4 patents

FUJIFILM CORP

4 patents

FUJITSU LTD

1 patent

ARAKAWA CHEM IND

1 patent

HITACHI GLOBAL STORAGE TECH

1 patent

IMAI NAOKICHI

1 patent

TOMIOKA NOBUYUKI

1 patent

Showing the top 50 of 112 patents by PatentIndex Score.