Inventor
FUNHOFF DIRK
DE15 patents
⚠️ This page may combine multiple inventors who share the name “FUNHOFF DIRK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
BASF AG
14 patentsUS5518824AMay 21, 1996
Electroluminescent arrangement
BASF AG120 citations97
US5429770AJul 4, 1995
Low-molecular-weight and polymeric liquid-crystalline benzotriazoles, and the use thereof
BASF AG20 citations92
US5049462ASep 17, 1991
Reading out information stored in thin polymer layers
BASF AG35 citations91
US5736068AApr 7, 1998
Triphenylene compounds and preparation of discotic liquid crystalline crosslinked polymers
BASF AG19 citations83
US5914219AJun 22, 1999
Radiation-sensitive mixture and the production of relief structures having improved contrast
BASF AG13 citations74
US5783354AJul 21, 1998
Positive-working radiation-sensitive mixture
BASF AG9 citations74
US5759750AJun 2, 1998
Radiation-sensitive mixture
BASF AG11 citations74
US5563022AOct 8, 1996
Positive-working radiation-sensitive mixture and the production of relief patterns
BASF AG11 citations74
US5318876AJun 7, 1994
Radiation-sensitive mixture containing acid-labile groups and production of relief patterns
BASF AG11 citations74
US5204178AApr 20, 1993
(meth)acrylate copolymers and their use in nonlinear optics and for the production of langmuir-blodgett
BASF AG7 citations73
US6552194B2Apr 22, 2003
Process for the preparation of pure triethylenediamine (TEDA)
BASF AG6 citations72
US5846689ADec 8, 1998
Positive-working radiation-sensitive mixture and production of relief structures
BASF AG2 citations63
US5393626AFeb 28, 1995
Increasing photoconductivity by adjusting the discotic phase
BASF AG3 citations62
US5103060AApr 7, 1992
Compounds which are ethylenically unsaturated in the terminal position, and the use thereof in nonlinear optics
BASF AG2 citations62