Inventor
ASAI NAOKO
JP12 patents
⚠️ This page may combine multiple inventors who share the name “ASAI NAOKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
11 patentsUS5733712AMar 31, 1998
Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed
HITACHI LTD62 citations96
US6225011B1May 1, 2001
Method for manufacturing semiconductor devices utilizing plurality of exposure systems
HITACHI LTD38 citations92
US6548312B1Apr 15, 2003
Manufacturing method of semiconductor integrated circuit devices and mask manufacturing methods
HITACHI LTD31 citations91
US6255036B1Jul 3, 2001
Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed
HITACHI LTD8 citations82
US5935765AAug 10, 1999
Resist pattern forming method using anti-reflective layer with variable extinction coefficient
HITACHI LTD10 citations82
US5846693ADec 8, 1998
Resist pattern forming method using anti-reflective layer with variable extinction coefficient
HITACHI LTD8 citations82
US6555295B1Apr 29, 2003
Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed
HITACHI LTD4 citations74
US6461776B1Oct 8, 2002
Resist pattern forming method using anti-reflective layer, with variable extinction coefficient
HITACHI LTD4 citations74
US6355400B1Mar 12, 2002
Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed
HITACHI LTD4 citations74
US6162588ADec 19, 2000
Resist pattern forming method using anti-reflective layer and method of etching using resist pattern
HITACHI LTD7 citations74
US5985517ANov 16, 1999
Resist pattern forming method using anti-reflective layer resist
HITACHI LTD4 citations74