Inventor
KUNKEL GERHARD
DE25 patents
⚠️ This page may combine multiple inventors who share the name “KUNKEL GERHARD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INFINEON TECHNOLOGIES AG
14 patentsUS6379869B1Apr 30, 2002
Method of improving the etch resistance of chemically amplified photoresists by introducing silicon after patterning
INFINEON TECHNOLOGIES AG36 citations92
US6420272B1Jul 16, 2002
Method for removal of hard mask used to define noble metal electrode
INFINEON TECHNOLOGIES AG29 citations90
US6383691B1May 7, 2002
Photomask and method for increasing image aspect ratio while relaxing mask fabrication requirements
INFINEON TECHNOLOGIES AG17 citations84
US6727989B1Apr 27, 2004
Enhanced overlay measurement marks for overlay alignment and exposure tool condition control
INFINEON TECHNOLOGIES AG16 citations82
US6606151B2Aug 12, 2003
Grating patterns and method for determination of azimuthal and radial aberration
INFINEON TECHNOLOGIES AG8 citations68
US6566219B2May 20, 2003
Method of forming a self aligned trench in a semiconductor using a patterned sacrificial layer for defining the trench opening
INFINEON TECHNOLOGIES AG4 citations62
US7465522B2Dec 16, 2008
Photolithographic mask having half tone main features and perpendicular half tone assist features
INFINEON TECHNOLOGIES AG4 citations60
US6842222B2Jan 11, 2005
Method of reducing pitch on semiconductor wafer
INFINEON TECHNOLOGIES AG3 citations59
US7074529B2Jul 11, 2006
Phase-shift mask
INFINEON TECHNOLOGIES AG1 citations51
US7248351B2Jul 24, 2007
Optimizing light path uniformity in inspection systems
INFINEON TECHNOLOGIES AG0 citations48
US6809800B2Oct 26, 2004
Apparatus for patterning a semiconductor wafer
INFINEON TECHNOLOGIES AG0 citations47
US6558883B2May 6, 2003
Apparatus and method for patterning a semiconductor wafer
INFINEON TECHNOLOGIES AG1 citations47
US7482110B2Jan 27, 2009
Method for adapting structure dimensions during the photolithographic projection of a pattern of structure elements onto a semiconductor wafer
INFINEON TECHNOLOGIES AG0 citations41
US7462426B2Dec 9, 2008
Method for producing a phase mask
INFINEON TECHNOLOGIES AG0 citations40
INFINEON TECHNOLOGIES CORP
6 patentsUS6211544B1Apr 3, 2001
Memory cell layout for reduced interaction between storage nodes and transistors
INFINEON TECHNOLOGIES CORP19 citations92
US6282116B1Aug 28, 2001
Dynamic random access memory
INFINEON TECHNOLOGIES CORP10 citations73
US6083788AJul 4, 2000
Stacked capacitor memory cell and method of manufacture
INFINEON TECHNOLOGIES CORP8 citations73
US6590657B1Jul 8, 2003
Semiconductor structures and manufacturing methods
INFINEON TECHNOLOGIES CORP12 citations72
US6118683ASep 12, 2000
Dynamic random access memory cell layout
INFINEON TECHNOLOGIES CORP6 citations62
US6365328B1Apr 2, 2002
Semiconductor structure and manufacturing method
INFINEON TECHNOLOGIES CORP3 citations61
IBM
3 patentsUS6451508B1Sep 17, 2002
Plural interleaved exposure process for increased feature aspect ratio in dense arrays
IBM24 citations92
US6511791B1Jan 28, 2003
Multiple exposure process for formation of dense rectangular arrays
IBM19 citations84
US6911687B1Jun 28, 2005
Buried bit line-field isolation defined active semiconductor areas
IBM10 citations74