Inventor
MANSFIELD SCOTT M
US34 patents
⚠️ This page may combine multiple inventors who share the name “MANSFIELD SCOTT M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
18 patentsUS7350183B2Mar 25, 2008
Method for improving optical proximity correction
IBM245 citations97
US5932377AAug 3, 1999
Exact transmission balanced alternating phase-shifting mask for photolithography
IBM86 citations96
US6346979B1Feb 12, 2002
Process and apparatus to adjust exposure dose in lithography systems
IBM68 citations95
US6413683B1Jul 2, 2002
Method for incorporating sub resolution assist features in a photomask layout
IBM52 citations93
US8365108B2Jan 29, 2013
Generating cut mask for double-patterning process
IBM20 citations92
US6541166B2Apr 1, 2003
Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures
IBM19 citations92
US5757842AMay 26, 1998
Method and apparatus for compensating thermal lensing effects in a laser cavity
IBM21 citations92
US7503028B2Mar 10, 2009
Multilayer OPC for design aware manufacturing
IBM8 citations84
US7343582B2Mar 11, 2008
Optical proximity correction using progressively smoothed mask shapes
IBM13 citations84
US9252022B1Feb 2, 2016
Patterning assist feature to mitigate reactive ion etch microloading effect
IBM17 citations83
US7650587B2Jan 19, 2010
Local coloring for hierarchical OPC
IBM10 citations83
US7607114B2Oct 20, 2009
Designer's intent tolerance bands for proximity correction and checking
IBM9 citations83
US7266798B2Sep 4, 2007
Designer's intent tolerance bands for proximity correction and checking
IBM15 citations83
US7261981B2Aug 28, 2007
System and method of smoothing mask shapes for improved placement of sub-resolution assist features
IBM8 citations72
US7765021B2Jul 27, 2010
Method to check model accuracy during wafer patterning simulation
IBM7 citations71
US7642020B2Jan 5, 2010
Method for separating optical and resist effects in process models
IBM5 citations63
US7565633B2Jul 21, 2009
Verifying mask layout printability using simulation with adjustable accuracy
IBM6 citations63
US7895547B2Feb 22, 2011
Test pattern based process model calibration
IBM0 citations41
INFINEON TECHNOLOGIES AG
3 patentsUS6421820B1Jul 16, 2002
Semiconductor device fabrication using a photomask with assist features
INFINEON TECHNOLOGIES AG293 citations99
US7945869B2May 17, 2011
Mask and method for patterning a semiconductor wafer
INFINEON TECHNOLOGIES AG5 citations63
US8039203B2Oct 18, 2011
Integrated circuits and methods of design and manufacture thereof
INFINEON TECHNOLOGIES AG3 citations62
UNIV LELAND STANFORD JUNIOR
3 patentsUS5004307AApr 2, 1991
Near field and solid immersion optical microscope
UNIV LELAND STANFORD JUNIOR215 citations99
US5125750AJun 30, 1992
Optical recording system employing a solid immersion lens
UNIV LELAND STANFORD JUNIOR279 citations98
US5121256AJun 9, 1992
Lithography system employing a solid immersion lens
UNIV LELAND STANFORD JUNIOR911 citations98
GLOBALFOUNDRIES INC
3 patentsUS9471743B1Oct 18, 2016
Predicting process fail limits
GLOBALFOUNDRIES INC3 citations72
US9910348B2Mar 6, 2018
Method of simultaneous lithography and etch correction flow
GLOBALFOUNDRIES INC4 citations71
US10516767B2Dec 24, 2019
Unifying realtime and static data for presenting over a web service
GLOBALFOUNDRIES INC0 citations41