Inventor

ALLEN ROBERT DAVID

US61 patents

⚠️ This page may combine multiple inventors who share the name “ALLEN ROBERT DAVID”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ALLEN ROBERT DAVID

IBM

Negative resists based on acid-catalyzed elimination of polar molecules

Process for generating negative tone resist images utilizing carbon dioxide critical fluid

Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions

Lithographic photoresist composition and process for its use in the manufacture of integrated circuits

Process for using bilayer photoresist

Photoresist composition

Molecular photoresists containing nonpolymeric silsesquioxanes

Photoresist composition comprising a copolymer of a hydroxystyrene and a (meth)acrylate substituted with an alicyclic ester substituent

Negative resists based on acid-catalyzed elimination of polar molecules

Imprint process using polyhedral oligomeric silsesquioxane based imprint materials

Photoresist topcoat for a photolithographic process

Negative resists based on a acid-catalyzed elimination of polar molecules

Photoresist composition and process for its use

Process for use of photoresist composition with deep ultraviolet radiation

Composite membranes with performance enhancing layers

Low activation energy dissolution modification agents for photoresist applications

Low activation energy photoresists

Immersion topcoat materials with improved performance

Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions

Composition for photoimaging

Photoresist composition

Photoresist composition

Process for using bilayer photoresist

Feedstock purification of polyester waste for recycling processes

Media recycling and sanitization

Recycling process for the recovery of cotton from polyester-cotton fabrics and/or fibers

Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials

Method for patterning a low activation energy photoresist

Low activation energy photoresist composition and process for its use

Porous silicon anode for rechargeable metal halide battery

High contact angle topcoat material and use thereof in lithography process

Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions

Resist composition with radiation sensitive acid generator

Immersion topcoat materials with improved performance

Feedstock engineering of polyester waste for recycling processes

TACLOV LLC

Feedstock purification of polyester waste for recycling processes

Recycling process for the recovery of cotton from polyester-cotton fabrics and/or fibers

Media recycling and sanitization

Feedstock engineering of polyester waste for recycling processes

SUMITOMO BAKELITE CO

Photoresist compositions comprising polycyclic polymers with acid labile pendant groups

Polycyclic polymers containing pendant cyclic anhydride groups

Modified polycyclic polymers

GOODRICH CO B F

Polycyclic resist compositions with increased etch resistance

Modified polycyclic polymers

Polycyclic resist compositions with increased etch resistance

ALLEN ROBERT DAVID

Polyamide membranes with fluoroalcohol functionality

Composite membrane with multi-layered active layer

Photo-patternable dielectric materials and formulations and methods of use

MOTOROLA INC

Actively controlled thermal panel and method therefor

Active spacecraft thermal control system and method