Inventor
BROCK PHILLIP JOE
US29 patents
⚠️ This page may combine multiple inventors who share the name “BROCK PHILLIP JOE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
22 patentsUS7393624B2Jul 1, 2008
Negative resists based on acid-catalyzed elimination of polar molecules
IBM57 citations98
US5658734AAug 19, 1997
Process for synthesizing chemical compounds
IBM306 citations97
US6653048B2Nov 25, 2003
High silicon content monomers and polymers suitable for 193 nm bilayer resists
IBM30 citations96
US6610456B2Aug 26, 2003
Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions
IBM57 citations96
US6548219B2Apr 15, 2003
Substituted norbornene fluoroacrylate copolymers and use thereof in lithographic photoresist compositions
IBM67 citations96
US6444408B1Sep 3, 2002
High silicon content monomers and polymers suitable for 193 nm bilayer resists
IBM35 citations96
US6509134B2Jan 21, 2003
Norbornene fluoroacrylate copolymers and process for the use thereof
IBM83 citations95
US7563558B2Jul 21, 2009
Negative resists based on acid-catalyzed elimination of polar molecules
IBM34 citations92
US7300739B2Nov 27, 2007
Negative resists based on a acid-catalyzed elimination of polar molecules
IBM33 citations92
US6251560B1Jun 26, 2001
Photoresist compositions with cyclic olefin polymers having lactone moiety
IBM20 citations91
US8029971B2Oct 4, 2011
Photopatternable dielectric materials for BEOL applications and methods for use
IBM11 citations84
US7919225B2Apr 5, 2011
Photopatternable dielectric materials for BEOL applications and methods for use
IBM15 citations84
US7358029B2Apr 15, 2008
Low activation energy dissolution modification agents for photoresist applications
IBM9 citations84
US7193023B2Mar 20, 2007
Low activation energy photoresists
IBM11 citations84
US6730452B2May 4, 2004
Lithographic photoresist composition and process for its use
IBM17 citations84
US7288362B2Oct 30, 2007
Immersion topcoat materials with improved performance
IBM11 citations83
US7521172B2Apr 21, 2009
Topcoat material and use thereof in immersion lithography processes
IBM7 citations70
US7820369B2Oct 26, 2010
Method for patterning a low activation energy photoresist
IBM3 citations63
US8034532B2Oct 11, 2011
High contact angle topcoat material and use thereof in lithography process
IBM4 citations62
US7855045B2Dec 21, 2010
Immersion topcoat materials with improved performance
IBM2 citations61
US9012587B2Apr 21, 2015
Photo-patternable dielectric materials and formulations and methods of use
IBM0 citations52
US7759044B2Jul 20, 2010
Low activation energy dissolution modification agents for photoresist applications
IBM0 citations52