Inventor

MEDEIROS DAVID R

US53 patents

⚠️ This page may combine multiple inventors who share the name “MEDEIROS DAVID R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MEDEIROS DAVID R

IBM

Ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device containing the same

Ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device containing the same

Negative resists based on acid-catalyzed elimination of polar molecules

Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made

Antireflective SiO-containing compositions for hardmask layer

Mask-making using resist having SIO bond-containing polymer

Multifunctional polymeric materials and use thereof

Photoresist composition

Negative resists based on acid-catalyzed elimination of polar molecules

Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof

Negative resists based on a acid-catalyzed elimination of polar molecules

Low temperature melt-processing of organic-inorganic hybrid

Underlayer compositions for multilayer lithographic processes

Process of drying a cast polymeric film disposed on a workpiece

Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made

Lithographic antireflective hardmask compositions and uses thereof

Graded spin-on organic antireflective coating for photolithography

Antireflective hardmask and uses thereof

Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging

High performance CMOS devices comprising gapped dual stressors with dielectric gap fillers, and methods of fabricating the same

Polymers and use thereof

Resist compositions comprising silyl ketals and methods of use thereof

Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof

Antireflective hardmask and uses thereof

Advanced chemically amplified resist for sub 30 nm dense feature resolution

Photoresist composition

Photoresist composition

Underlayer compositions for multilayer lithographic processes

Graded spin-on organic antireflective coating for photolithography

Synthesis and application of photosensitive pentacene precursor in organic thin film transistors

Apparatus for photo exposure of materials with subsequent capturing of volatiles for analysis

Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof

Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer

Use of an energy source to convert precursors into patterned semiconductors

Etch improved resist systems containing acrylate (or methacrylate) silane monomers

Bleachable materials for lithography

High performance CMOS devices comprising gapped dual stressors with dielectric gap fillers, and methods of fabricating the same

Method for tuning epitaxial growth by interfacial doping and structure including same

Low temperature melt-processing of organic-inorganic hybrid

Method for tuning epitaxial growth by interfacial doping and structure including same

Low temperature melt-processing of organic-inorganic hybrid

Polymers and use thereof

SHIPLEY CO

Radiation sensitive compositions comprising polymer having acid labile groups

Radiation sensitive compositions comprising polymer having acid labile groups

GOLDFARB DARIO L

Organic graded spin on BARC compositions for high NA lithography

Organic graded spin on BARC compositions for high NA lithography

LNTERNAT BUSINESS MACHINES COR

Supercritical fluid(SCF) silylation process

CHENG JOY

Self-segregating multilayer imaging stack with built-in antireflective properties

DEHAVEN PATRICK W

Low temperature melt-processing of organic-inorganic hybrid

BURNS SEAN D

Antireflective hardmask composition and a method of preparing a patterned material using same