Inventor
BARR ROBERT K
US48 patents
⚠️ This page may combine multiple inventors who share the name “BARR ROBERT K”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ROHM & HAAS ELECT MAT
20 patentsUS7615335B2Nov 10, 2009
Imaging methods
ROHM & HAAS ELECT MAT15 citations92
US7144676B2Dec 5, 2006
Imaging compositions and methods
ROHM & HAAS ELECT MAT25 citations92
US7364834B2Apr 29, 2008
Functional polymer
ROHM & HAAS ELECT MAT9 citations83
US7148265B2Dec 12, 2006
Functional polymer
ROHM & HAAS ELECT MAT11 citations83
US7977026B2Jul 12, 2011
Imaging methods
ROHM & HAAS ELECT MAT4 citations73
US7223519B2May 29, 2007
Imaging compositions and methods
ROHM & HAAS ELECT MAT7 citations73
US11337309B2May 17, 2022
Methods of manufacturing printed wire boards
ROHM & HAAS ELECT MAT3 citations62
US8048606B2Nov 1, 2011
Imaging methods
ROHM & HAAS ELECT MAT2 citations62
US7955989B2Jun 7, 2011
Texturing semiconductor substrates
ROHM & HAAS ELECT MAT4 citations62
US7632621B2Dec 15, 2009
Mask
ROHM & HAAS ELECT MAT5 citations60
US9611402B2Apr 4, 2017
Hot melt compositions with improved etch resistance
ROHM & HAAS ELECT MAT0 citations52
US9598590B2Mar 21, 2017
Hot melt compositions with improved etch resistance
ROHM & HAAS ELECT MAT0 citations52
US9453139B2Sep 27, 2016
Hot melt compositions with improved etch resistance
ROHM & HAAS ELECT MAT0 citations52
US9303207B2Apr 5, 2016
Texturing of monocrystalline semiconductor substrates to reduce incident light reflectance
ROHM & HAAS ELECT MAT0 citations52
US8053160B2Nov 8, 2011
Imaging compositions and methods
ROHM & HAAS ELECT MAT1 citations52
US7749685B2Jul 6, 2010
Imaging methods
ROHM & HAAS ELECT MAT0 citations52
US7270932B2Sep 18, 2007
Imaging composition and method
ROHM & HAAS ELECT MAT1 citations48
US11639398B2May 2, 2023
Photosensitive bismaleimide composition
ROHM & HAAS ELECT MAT0 citations47
US11603422B2Mar 14, 2023
Polymeric resin for dielectric applications
ROHM & HAAS ELECT MAT0 citations47
US10583459B2Mar 10, 2020
Imaging three dimensional substrates using a transfer film
ROHM & HAAS ELECT MAT0 citations39
MORTON INT INC
10 patentsUS6329123B1Dec 11, 2001
Photoimageable compositions having improved flexibility and stripping ability
MORTON INT INC18 citations92
US6054252AApr 25, 2000
Photoimageable compositions having improved chemical resistance and stripping ability
MORTON INT INC43 citations92
US5320933AJun 14, 1994
Photoimageable composition having improved adhesion promoter
MORTON INT INC28 citations92
US5364737ANov 15, 1994
Waterbone photoresists having associate thickeners
MORTON INT INC13 citations82
US5387494AFeb 7, 1995
Waterborne photoresists having polysiloxanes
MORTON INT INC12 citations79
US5393643AFeb 28, 1995
Waterborne photoresists having binders neutralized with amino acrylates
MORTON INT INC15 citations78
US5389495AFeb 14, 1995
Waterborne photoresists having non-ionic fluorocarbon surfactants
MORTON INT INC9 citations74
US6045973AApr 4, 2000
Photoimageable compositions having improved chemical resistance and stripping ability
MORTON INT INC11 citations73
US5922509AJul 13, 1999
Photoimageable compositions having improved stripping properties in aqueous alkaline solutions
MORTON INT INC13 citations72
US5411837AMay 2, 1995
Waterborne photoresists having binders with sulfonic acid functionality
MORTON INT INC7 citations69
BARR ROBERT K
5 patentsUS9206520B2Dec 8, 2015
Inhibiting background plating
BARR ROBERT K27 citations90
US8722544B2May 13, 2014
Method of cleaning and micro-etching semiconductor wafers
BARR ROBERT K2 citations62
US8460474B2Jun 11, 2013
Method of cleaning semiconductor wafers
BARR ROBERT K2 citations61
US9663715B2May 30, 2017
Polycrystalline texturing composition and method
BARR ROBERT K0 citations51
US8470717B2Jun 25, 2013
Method of forming current tracks on semiconductors
BARR ROBERT K0 citations51
SHIPLEY CO LLC
4 patentsUS6900003B2May 31, 2005
Photoresist processing aid and method
SHIPLEY CO LLC7 citations73
US6887654B2May 3, 2005
Residue and scum reducing composition and method
SHIPLEY CO LLC8 citations70
US6855480B2Feb 15, 2005
Photoresist composition
SHIPLEY CO LLC7 citations67
US6166245ADec 26, 2000
Photoimageable compositions having improved chemical resistance and stripping ability
SHIPLEY CO LLC6 citations62