Inventor

STOJAKOVIC GEORGE

DE13 patents

⚠️ This page may combine multiple inventors who share the name “STOJAKOVIC GEORGE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LAM RES CORP

5 patents

US10629458B2Apr 21, 2020

Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameter

LAM RES CORP1 citations72

US8349202B2Jan 8, 2013

Methods for controlling bevel edge etching in a plasma chamber

LAM RES CORP5 citations71

US7316785B2Jan 8, 2008

Methods and apparatus for the optimization of etch resistance in a plasma processing system

LAM RES CORP3 citations60

US10832923B2Nov 10, 2020

Lower plasma-exclusion-zone rings for a bevel etcher

LAM RES CORP0 citations51

US10811282B2Oct 20, 2020

Upper plasma-exclusion-zone rings for a bevel etcher

LAM RES CORP0 citations51

IBM

2 patents

US6984529B2Jan 10, 2006

Fabrication process for a magnetic tunnel junction device

IBM106 citations94

US7097777B2Aug 29, 2006

Magnetic switching device

IBM9 citations73

INFINEON TECHNOLOGIES CORP

2 patents

US6184134B1Feb 6, 2001

Dry process for cleaning residues/polymers after metal etch

INFINEON TECHNOLOGIES CORP33 citations92

US6815364B2Nov 9, 2004

Tungsten hard mask

INFINEON TECHNOLOGIES CORP6 citations62

FANG TONG

2 patents

US8398778B2Mar 19, 2013

Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameter

FANG TONG7 citations82

US8083890B2Dec 27, 2011

Gas modulation to control edge exclusion in a bevel edge etching plasma chamber

FANG TONG6 citations71

INFINEON TECHNOLOGIES AG

1 patent

US6815248B2Nov 9, 2004

Material combinations for tunnel junction cap layer, tunnel junction hard mask and tunnel junction stack seed layer in MRAM processing

INFINEON TECHNOLOGIES AG32 citations92

TOSHIBA KK

1 patent

US7015049B2Mar 21, 2006

Fence-free etching of iridium barrier having a steep taper angle

TOSHIBA KK11 citations83