Inventor

NOZAWA TOSHIHISA

JP81 patents

⚠️ This page may combine multiple inventors who share the name “NOZAWA TOSHIHISA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NOZAWA TOSHIHISA

TOKYO ELECTRON LTD

Plasma etching apparatus

Electrostatic chuck having a multilayer structure for attracting an object

Electrostatic chuck and plasma apparatus equipped therewith

Plasma treating apparatus

Support table for plate-like body and processing apparatus using the table

Apparatus for forming reduced pressure and for processing object

Liquid level detecting device and a processing apparatus

Plasma processing device

Plasma processing apparatus

Plasma processing system for treating a substrate

Film forming apparatus

Plasma processing equipment

Substrate processing apparatus

Magnetron plasma process apparatus

Heat-treatment furnace

Manufacturing method of top plate of plasma processing apparatus

Plasma apparatus, and method and system for extracting electrical signal of member to which high-frequency wave is applied

Plasma processing apparatus

Method for treating a substrate

Processing apparatus and processing method

Film forming apparatus and shower head

Placing bed structure, treating apparatus using the structure, and method for using the apparatus

Ceiling plate and plasma process apparatus

Microwave plasma processing apparatus

Substrate processing apparatus

Plasma processing apparatus and plasma processing method

Multi-cell resonator microwave surface-wave plasma apparatus

ASM IP HOLDING BV

Method of depositing and etching Si-containing film

Substrate processing apparatus having electrostatic chuck and substrate processing method

Substrate processing method and apparatus

Wafer processing apparatus, recording medium and wafer conveying method

Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method

Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method

Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method

Method of forming structures using a neutral beam

Method of forming structures using a neutral beam

NOZAWA TOSHIHISA

Plasma processing apparatus, plasma processing method, method for cleaning plasma processing apparatus and pressure control valve for plasma processing apparatus

On-off valve and process apparatus employing the on-off valve

Substrate processing apparatus and temperature control device

Processing device

Plasma treatment device and optical monitor device

KOBE STEEL LTD

Method for microfabricating diamond

TIAN CAIZHONG

Top plate of microwave plasma processing apparatus, plasma processing apparatus and plasma processing method

KAWAMURA KOHEI

Placing bed structure, treating apparatus using the structure, and method for using the apparatus

OKESAKU MASAHIRO

Shower plate sintered integrally with gas release hole member and method for manufacturing the same

ZHAO JIANPING

Plasma generation controlled by gravity-induced gas-diffusion separation (GIGDS) techniques

IWASAKI MASAHIDE

Plasma processing apparatus and gas supply device for plasma processing apparatus

FAGUET JACQUES

Method and system for performing different deposition processes within a single chamber

MATSUOKA TAKAAKI

Etching method, substrate processing method, pattern forming method, method for manufacturing semiconductor element, and semiconductor element

UEDA HIROKAZU

Film forming method of silicon oxide film, silicon oxide film, semiconductor device, and manufacturing method of semiconductor device