P

Inventor

AJIKA NATSUO

JP70 patents
⚠️ This page may combine multiple inventors who share the name “AJIKA NATSUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MITSUBISHI ELECTRIC CORP

49 patents
US5745417AApr 28, 1998

Electrically programmable and erasable nonvolatile semiconductor memory device and operating method therefor

MITSUBISHI ELECTRIC CORP135 citations99
US5355022AOct 11, 1994

Stacked-type semiconductor device

MITSUBISHI ELECTRIC CORP347 citations99
US5049975ASep 17, 1991

Multi-layered interconnection structure for a semiconductor device

MITSUBISHI ELECTRIC CORP152 citations99
US5341028AAug 23, 1994

Semiconductor device and a method of manufacturing thereof

MITSUBISHI ELECTRIC CORP143 citations98
US6172397B1Jan 9, 2001

Non-volatile semiconductor memory device

MITSUBISHI ELECTRIC CORP83 citations96
US6034393AMar 7, 2000

Nonvolatile semiconductor memory device using trench isolation and manufacturing method thereof

MITSUBISHI ELECTRIC CORP60 citations96
US5898606AApr 27, 1999

Electrically programmable and erasable nonvolatile semiconductor memory device and operating method therefor

MITSUBISHI ELECTRIC CORP63 citations96
US5523596AJun 4, 1996

Semiconductor device having capacitor and manufacturing method therefor

MITSUBISHI ELECTRIC CORP53 citations96
US5504376AApr 2, 1996

Stacked-type semiconductor device

MITSUBISHI ELECTRIC CORP84 citations96
US5378643AJan 3, 1995

Electrically programmable non-volatile semiconductor memory device and manufacturing method thereof

MITSUBISHI ELECTRIC CORP50 citations96
US5162262ANov 10, 1992

Multi-layered interconnection structure for a semiconductor device and manufactured method thereof

MITSUBISHI ELECTRIC CORP57 citations96
US5051948ASep 24, 1991

Content addressable memory device

MITSUBISHI ELECTRIC CORP81 citations96
US5994733ANov 30, 1999

Nonvolatile semiconductor memory device and method of fabricating the same

MITSUBISHI ELECTRIC CORP84 citations95
US5877524AMar 2, 1999

Non-volatile semiconductor memory device

MITSUBISHI ELECTRIC CORP52 citations95
US5659505AAug 19, 1997

Electrically programmable and erasable nonvolatile semiconductor memory device and operating method therefor

MITSUBISHI ELECTRIC CORP67 citations95
US5444282AAug 22, 1995

Semiconductor device and a method of manufacturing thereof

MITSUBISHI ELECTRIC CORP100 citations95
US5994732ANov 30, 1999

Nonvolatile semiconductor memory device

MITSUBISHI ELECTRIC CORP36 citations93
US5798289AAug 25, 1998

Method of manufacturing stacked capacitors in a DRAM with reduced isolation region between adjacent capacitors

MITSUBISHI ELECTRIC CORP20 citations93
US5621689AApr 15, 1997

Nonvolatile semiconductor memory device having controlled charge pump load

MITSUBISHI ELECTRIC CORP19 citations93
US5597755AJan 28, 1997

Method of manufacturing a stacked capacitor in a dram

MITSUBISHI ELECTRIC CORP25 citations93
US5554867ASep 10, 1996

Nonvolatile semiconductor memory device having a memory cell transistor and a select transistor

MITSUBISHI ELECTRIC CORP39 citations93
US5381365AJan 10, 1995

Dynamic random access memory having stacked type capacitor and manufacturing method therefor

MITSUBISHI ELECTRIC CORP33 citations93
US5364811ANov 15, 1994

Method of manufacturing a semiconductor memory device with multiple device forming regions

MITSUBISHI ELECTRIC CORP26 citations93
US5275629AJan 4, 1994

Semiconductor device manufacturing apparatus

MITSUBISHI ELECTRIC CORP33 citations93
US5240872AAug 31, 1993

Method of manufacturing semiconductor device having interconnection layer contacting source/drain regions

MITSUBISHI ELECTRIC CORP29 citations93
US5218219AJun 8, 1993

Semiconductor memory device having a peripheral wall at the boundary region of a memory cell array region and a peripheral circuit region

MITSUBISHI ELECTRIC CORP35 citations93
US5194925AMar 16, 1993

Electrically programmable non-volatie semiconductor memory device

MITSUBISHI ELECTRIC CORP45 citations93
US5173752ADec 22, 1992

Semiconductor device having interconnection layer contacting source/drain regions

MITSUBISHI ELECTRIC CORP22 citations93
US5141891AAug 25, 1992

MIS-type semiconductor device of LDD structure and manufacturing method thereof

MITSUBISHI ELECTRIC CORP33 citations93
US4988635AJan 29, 1991

Method of manufacturing non-volatile semiconductor memory device

MITSUBISHI ELECTRIC CORP26 citations93
US6107659AAug 22, 2000

Nonvolatile semiconductor memory device operable at high speed with low power supply voltage while preventing overerasing/overwriting

MITSUBISHI ELECTRIC CORP51 citations92
US6014328AJan 11, 2000

Memory cell allowing write and erase with low voltage power supply and nonvolatile semiconductor memory device provided with the same

MITSUBISHI ELECTRIC CORP32 citations92
US5978264ANov 2, 1999

Nonvolatile semiconductor memory device operable at high speed with low power supply voltage while suppressing increase of chip area

MITSUBISHI ELECTRIC CORP27 citations92
US5672533ASep 30, 1997

Field effect transistor having impurity regions of different depths and manufacturing method thereof

MITSUBISHI ELECTRIC CORP37 citations92
US5538912AJul 23, 1996

Method of making memory cells with peripheral transistors

MITSUBISHI ELECTRIC CORP38 citations92
US5489791AFeb 6, 1996

Field effect transistor having impurity regions of different depths and manufacturing method thereof

MITSUBISHI ELECTRIC CORP22 citations92
US5400278AMar 21, 1995

Semiconductor memory device and method of manufacturing the same

MITSUBISHI ELECTRIC CORP24 citations92
US5355012AOct 11, 1994

Semiconductor device

MITSUBISHI ELECTRIC CORP39 citations92
US5600164AFeb 4, 1997

Non-volatile semiconductor memory device

MITSUBISHI ELECTRIC CORP43 citations90
US5434439AJul 18, 1995

Dynamic random access memory having stacked type capacitor and manufacturing method therefor

MITSUBISHI ELECTRIC CORP18 citations82
US5276344AJan 4, 1994

Field effect transistor having impurity regions of different depths and manufacturing method thereof

MITSUBISHI ELECTRIC CORP17 citations82
US4989054AJan 29, 1991

Non-volatile semiconductor memory device using contact hole connection

MITSUBISHI ELECTRIC CORP19 citations82
US6441426B1Aug 27, 2002

Nonvolatile semiconductor memory device and method of manufacturing the same

MITSUBISHI ELECTRIC CORP11 citations74
US5683929ANov 4, 1997

Method of manufacturing a semiconductor device having a capacitor

MITSUBISHI ELECTRIC CORP9 citations74
US5446301AAug 29, 1995

Semiconductor device including semiconductor layer having impurity region and method of manufacturing the same

MITSUBISHI ELECTRIC CORP6 citations74
US5381029AJan 10, 1995

Semiconductor device including semiconductor layer having impurity region and method of manufacturing the same

MITSUBISHI ELECTRIC CORP15 citations74
US5347151ASep 13, 1994

DRAM with memory cells having access transistor formed on solid phase epitaxial single crystalline layer and manufacturing method thereof

MITSUBISHI ELECTRIC CORP8 citations74
US5338699AAug 16, 1994

Method of making a semiconductor integrated device having gate sidewall structure

MITSUBISHI ELECTRIC CORP8 citations74
US5338957AAug 16, 1994

Nonvolatile semiconductor device and a method of manufacturing thereof

MITSUBISHI ELECTRIC CORP12 citations74

GENUSION INC

1 patent

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