Inventor
AJIKA NATSUO
JP70 patents
⚠️ This page may combine multiple inventors who share the name “AJIKA NATSUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI ELECTRIC CORP
49 patentsUS5745417AApr 28, 1998
Electrically programmable and erasable nonvolatile semiconductor memory device and operating method therefor
MITSUBISHI ELECTRIC CORP135 citations99
US5355022AOct 11, 1994
Stacked-type semiconductor device
MITSUBISHI ELECTRIC CORP347 citations99
US5049975ASep 17, 1991
Multi-layered interconnection structure for a semiconductor device
MITSUBISHI ELECTRIC CORP152 citations99
US5341028AAug 23, 1994
Semiconductor device and a method of manufacturing thereof
MITSUBISHI ELECTRIC CORP143 citations98
US6172397B1Jan 9, 2001
Non-volatile semiconductor memory device
MITSUBISHI ELECTRIC CORP83 citations96
US6034393AMar 7, 2000
Nonvolatile semiconductor memory device using trench isolation and manufacturing method thereof
MITSUBISHI ELECTRIC CORP60 citations96
US5898606AApr 27, 1999
Electrically programmable and erasable nonvolatile semiconductor memory device and operating method therefor
MITSUBISHI ELECTRIC CORP63 citations96
US5523596AJun 4, 1996
Semiconductor device having capacitor and manufacturing method therefor
MITSUBISHI ELECTRIC CORP53 citations96
US5504376AApr 2, 1996
Stacked-type semiconductor device
MITSUBISHI ELECTRIC CORP84 citations96
US5378643AJan 3, 1995
Electrically programmable non-volatile semiconductor memory device and manufacturing method thereof
MITSUBISHI ELECTRIC CORP50 citations96
US5162262ANov 10, 1992
Multi-layered interconnection structure for a semiconductor device and manufactured method thereof
MITSUBISHI ELECTRIC CORP57 citations96
US5051948ASep 24, 1991
Content addressable memory device
MITSUBISHI ELECTRIC CORP81 citations96
US5994733ANov 30, 1999
Nonvolatile semiconductor memory device and method of fabricating the same
MITSUBISHI ELECTRIC CORP84 citations95
US5877524AMar 2, 1999
Non-volatile semiconductor memory device
MITSUBISHI ELECTRIC CORP52 citations95
US5659505AAug 19, 1997
Electrically programmable and erasable nonvolatile semiconductor memory device and operating method therefor
MITSUBISHI ELECTRIC CORP67 citations95
US5444282AAug 22, 1995
Semiconductor device and a method of manufacturing thereof
MITSUBISHI ELECTRIC CORP100 citations95
US5994732ANov 30, 1999
Nonvolatile semiconductor memory device
MITSUBISHI ELECTRIC CORP36 citations93
US5798289AAug 25, 1998
Method of manufacturing stacked capacitors in a DRAM with reduced isolation region between adjacent capacitors
MITSUBISHI ELECTRIC CORP20 citations93
US5621689AApr 15, 1997
Nonvolatile semiconductor memory device having controlled charge pump load
MITSUBISHI ELECTRIC CORP19 citations93
US5597755AJan 28, 1997
Method of manufacturing a stacked capacitor in a dram
MITSUBISHI ELECTRIC CORP25 citations93
US5554867ASep 10, 1996
Nonvolatile semiconductor memory device having a memory cell transistor and a select transistor
MITSUBISHI ELECTRIC CORP39 citations93
US5381365AJan 10, 1995
Dynamic random access memory having stacked type capacitor and manufacturing method therefor
MITSUBISHI ELECTRIC CORP33 citations93
US5364811ANov 15, 1994
Method of manufacturing a semiconductor memory device with multiple device forming regions
MITSUBISHI ELECTRIC CORP26 citations93
US5275629AJan 4, 1994
Semiconductor device manufacturing apparatus
MITSUBISHI ELECTRIC CORP33 citations93
US5240872AAug 31, 1993
Method of manufacturing semiconductor device having interconnection layer contacting source/drain regions
MITSUBISHI ELECTRIC CORP29 citations93
US5218219AJun 8, 1993
Semiconductor memory device having a peripheral wall at the boundary region of a memory cell array region and a peripheral circuit region
MITSUBISHI ELECTRIC CORP35 citations93
US5194925AMar 16, 1993
Electrically programmable non-volatie semiconductor memory device
MITSUBISHI ELECTRIC CORP45 citations93
US5173752ADec 22, 1992
Semiconductor device having interconnection layer contacting source/drain regions
MITSUBISHI ELECTRIC CORP22 citations93
US5141891AAug 25, 1992
MIS-type semiconductor device of LDD structure and manufacturing method thereof
MITSUBISHI ELECTRIC CORP33 citations93
US4988635AJan 29, 1991
Method of manufacturing non-volatile semiconductor memory device
MITSUBISHI ELECTRIC CORP26 citations93
US6107659AAug 22, 2000
Nonvolatile semiconductor memory device operable at high speed with low power supply voltage while preventing overerasing/overwriting
MITSUBISHI ELECTRIC CORP51 citations92
US6014328AJan 11, 2000
Memory cell allowing write and erase with low voltage power supply and nonvolatile semiconductor memory device provided with the same
MITSUBISHI ELECTRIC CORP32 citations92
US5978264ANov 2, 1999
Nonvolatile semiconductor memory device operable at high speed with low power supply voltage while suppressing increase of chip area
MITSUBISHI ELECTRIC CORP27 citations92
US5672533ASep 30, 1997
Field effect transistor having impurity regions of different depths and manufacturing method thereof
MITSUBISHI ELECTRIC CORP37 citations92
US5538912AJul 23, 1996
Method of making memory cells with peripheral transistors
MITSUBISHI ELECTRIC CORP38 citations92
US5489791AFeb 6, 1996
Field effect transistor having impurity regions of different depths and manufacturing method thereof
MITSUBISHI ELECTRIC CORP22 citations92
US5400278AMar 21, 1995
Semiconductor memory device and method of manufacturing the same
MITSUBISHI ELECTRIC CORP24 citations92
US5355012AOct 11, 1994
Semiconductor device
MITSUBISHI ELECTRIC CORP39 citations92
US5600164AFeb 4, 1997
Non-volatile semiconductor memory device
MITSUBISHI ELECTRIC CORP43 citations90
US5434439AJul 18, 1995
Dynamic random access memory having stacked type capacitor and manufacturing method therefor
MITSUBISHI ELECTRIC CORP18 citations82
US5276344AJan 4, 1994
Field effect transistor having impurity regions of different depths and manufacturing method thereof
MITSUBISHI ELECTRIC CORP17 citations82
US4989054AJan 29, 1991
Non-volatile semiconductor memory device using contact hole connection
MITSUBISHI ELECTRIC CORP19 citations82
US6441426B1Aug 27, 2002
Nonvolatile semiconductor memory device and method of manufacturing the same
MITSUBISHI ELECTRIC CORP11 citations74
US5683929ANov 4, 1997
Method of manufacturing a semiconductor device having a capacitor
MITSUBISHI ELECTRIC CORP9 citations74
US5446301AAug 29, 1995
Semiconductor device including semiconductor layer having impurity region and method of manufacturing the same
MITSUBISHI ELECTRIC CORP6 citations74
US5381029AJan 10, 1995
Semiconductor device including semiconductor layer having impurity region and method of manufacturing the same
MITSUBISHI ELECTRIC CORP15 citations74
US5347151ASep 13, 1994
DRAM with memory cells having access transistor formed on solid phase epitaxial single crystalline layer and manufacturing method thereof
MITSUBISHI ELECTRIC CORP8 citations74
US5338699AAug 16, 1994
Method of making a semiconductor integrated device having gate sidewall structure
MITSUBISHI ELECTRIC CORP8 citations74
US5338957AAug 16, 1994
Nonvolatile semiconductor device and a method of manufacturing thereof
MITSUBISHI ELECTRIC CORP12 citations74
GENUSION INC
1 patentShowing the top 50 of 70 patents by PatentIndex Score.