Inventor
OTSUKA TAKAHISA
JP18 patents
⚠️ This page may combine multiple inventors who share the name “OTSUKA TAKAHISA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
13 patentsUS7877895B2Feb 1, 2011
Substrate processing apparatus
TOKYO ELECTRON LTD30 citations92
US11712710B2Aug 1, 2023
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD3 citations72
US11862486B2Jan 2, 2024
Substrate liquid processing apparatus, substrate liquid processing method and recording medium
TOKYO ELECTRON LTD0 citations62
US7816276B2Oct 19, 2010
Substrate treatment system, substrate treatment method, and computer readable storage medium
TOKYO ELECTRON LTD4 citations62
US7628612B2Dec 8, 2009
Heat treatment apparatus, heat treatment method, and computer readable storage medium
TOKYO ELECTRON LTD6 citations62
US11024518B2Jun 1, 2021
Substrate processing apparatus, substrate processing method and recording medium
TOKYO ELECTRON LTD0 citations52
US10770316B2Sep 8, 2020
Substrate liquid processing apparatus, substrate liquid processing method and recording medium
TOKYO ELECTRON LTD0 citations51
US10685858B2Jun 16, 2020
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations51
US7977038B2Jul 12, 2011
Substrate processing method, substrate processing system, and computer-readable recording medium recording program thereon
TOKYO ELECTRON LTD0 citations51
US9865483B2Jan 9, 2018
Substrate liquid processing method, substrate liquid processing apparatus, and recording medium
TOKYO ELECTRON LTD1 citations50
US11769661B2Sep 26, 2023
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations47
US7938587B2May 10, 2011
Substrate processing method, computer storage medium and substrate processing system
TOKYO ELECTRON LTD0 citations40
US9108228B2Aug 18, 2015
Liquid processing apparatus having switchable nozzles
TOKYO ELECTRON LTD0 citations39
OTSUKA TAKAHISA
4 patentsUS8181356B2May 22, 2012
Substrate processing method
OTSUKA TAKAHISA3 citations61
US8168378B2May 1, 2012
Substrate treatment system, substrate treatment method, and computer readable storage medium
OTSUKA TAKAHISA2 citations61
US8587763B2Nov 19, 2013
Substrate processing method, substrate processing system, and computer-readable recording medium recording program thereon
OTSUKA TAKAHISA3 citations60
US8247164B2Aug 21, 2012
Resist film forming method
OTSUKA TAKAHISA2 citations60