P

Inventor

PAN HONG-TSZ

US35 patents
⚠️ This page may combine multiple inventors who share the name “PAN HONG-TSZ”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

UNITED MICROELECTRONICS CORP

20 patents
US5798298AAug 25, 1998

Method of automatically generating dummy metals for multilevel interconnection

UNITED MICROELECTRONICS CORP177 citations99
US6258692B1Jul 10, 2001

Method forming shallow trench isolation

UNITED MICROELECTRONICS CORP60 citations96
US5393702AFeb 28, 1995

Via sidewall SOG nitridation for via filling

UNITED MICROELECTRONICS CORP58 citations94
US5902752AMay 11, 1999

Active layer mask with dummy pattern

UNITED MICROELECTRONICS CORP53 citations93
US5478678ADec 26, 1995

Double rim phase shifter mask

UNITED MICROELECTRONICS CORP21 citations93
US6022795AFeb 8, 2000

Salicide formation process

UNITED MICROELECTRONICS CORP23 citations92
US5308787AMay 3, 1994

Uniform field oxidation for locos isolation

UNITED MICROELECTRONICS CORP23 citations92
US5650346AJul 22, 1997

Method of forming MOSFET devices with buried bitline capacitors

UNITED MICROELECTRONICS CORP19 citations84
US6156633ADec 5, 2000

Process for forming high temperature stable self-aligned metal silicide layer

UNITED MICROELECTRONICS CORP9 citations74
US5970379AOct 19, 1999

Method of reducing loss of metal silicide in pre-metal etching

UNITED MICROELECTRONICS CORP9 citations74
US5895945AApr 20, 1999

Single polysilicon neuron MOSFET

UNITED MICROELECTRONICS CORP9 citations74
US5510214AApr 23, 1996

Double destruction phase shift mask

UNITED MICROELECTRONICS CORP12 citations74
US5496200AMar 5, 1996

Sealed vacuum electronic devices

UNITED MICROELECTRONICS CORP16 citations74
US5449644ASep 12, 1995

Process for contact hole formation using a sacrificial SOG layer

UNITED MICROELECTRONICS CORP12 citations74
US5533634AJul 9, 1996

Quantum chromeless lithography

UNITED MICROELECTRONICS CORP16 citations72
US6833318B2Dec 21, 2004

Gap-filling process

UNITED MICROELECTRONICS CORP8 citations69
US5478679ADec 26, 1995

Half-tone self-aligning phase shifting mask

UNITED MICROELECTRONICS CORP14 citations68
US6670249B1Dec 30, 2003

Process for forming high temperature stable self-aligned metal silicide layer

UNITED MICROELECTRONICS CORP3 citations63
US6010958AJan 4, 2000

Method for improving the planarization of dielectric layer in the fabrication of metallic interconnects

UNITED MICROELECTRONICS CORP6 citations62
US6277721B1Aug 21, 2001

Salicide formation process

UNITED MICROELECTRONICS CORP1 citations52

XILINX INC

5 patents

NEUROPREX INC

3 patents

RAHMAN ARIFUR

2 patents

CHONG NUI

2 patents

PAN HONG-TSZ

2 patents

NGUYEN BANG-THU

1 patent