Inventor
PAN HONG-TSZ
US35 patents
⚠️ This page may combine multiple inventors who share the name “PAN HONG-TSZ”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNITED MICROELECTRONICS CORP
20 patentsUS5798298AAug 25, 1998
Method of automatically generating dummy metals for multilevel interconnection
UNITED MICROELECTRONICS CORP177 citations99
US6258692B1Jul 10, 2001
Method forming shallow trench isolation
UNITED MICROELECTRONICS CORP60 citations96
US5393702AFeb 28, 1995
Via sidewall SOG nitridation for via filling
UNITED MICROELECTRONICS CORP58 citations94
US5902752AMay 11, 1999
Active layer mask with dummy pattern
UNITED MICROELECTRONICS CORP53 citations93
US5478678ADec 26, 1995
Double rim phase shifter mask
UNITED MICROELECTRONICS CORP21 citations93
US6022795AFeb 8, 2000
Salicide formation process
UNITED MICROELECTRONICS CORP23 citations92
US5308787AMay 3, 1994
Uniform field oxidation for locos isolation
UNITED MICROELECTRONICS CORP23 citations92
US5650346AJul 22, 1997
Method of forming MOSFET devices with buried bitline capacitors
UNITED MICROELECTRONICS CORP19 citations84
US6156633ADec 5, 2000
Process for forming high temperature stable self-aligned metal silicide layer
UNITED MICROELECTRONICS CORP9 citations74
US5970379AOct 19, 1999
Method of reducing loss of metal silicide in pre-metal etching
UNITED MICROELECTRONICS CORP9 citations74
US5895945AApr 20, 1999
Single polysilicon neuron MOSFET
UNITED MICROELECTRONICS CORP9 citations74
US5510214AApr 23, 1996
Double destruction phase shift mask
UNITED MICROELECTRONICS CORP12 citations74
US5496200AMar 5, 1996
Sealed vacuum electronic devices
UNITED MICROELECTRONICS CORP16 citations74
US5449644ASep 12, 1995
Process for contact hole formation using a sacrificial SOG layer
UNITED MICROELECTRONICS CORP12 citations74
US5533634AJul 9, 1996
Quantum chromeless lithography
UNITED MICROELECTRONICS CORP16 citations72
US6833318B2Dec 21, 2004
Gap-filling process
UNITED MICROELECTRONICS CORP8 citations69
US5478679ADec 26, 1995
Half-tone self-aligning phase shifting mask
UNITED MICROELECTRONICS CORP14 citations68
US6670249B1Dec 30, 2003
Process for forming high temperature stable self-aligned metal silicide layer
UNITED MICROELECTRONICS CORP3 citations63
US6010958AJan 4, 2000
Method for improving the planarization of dielectric layer in the fabrication of metallic interconnects
UNITED MICROELECTRONICS CORP6 citations62
US6277721B1Aug 21, 2001
Salicide formation process
UNITED MICROELECTRONICS CORP1 citations52
XILINX INC
5 patentsUS8350365B1Jan 8, 2013
Mitigation of well proximity effect in integrated circuits
XILINX INC9 citations84
US7737020B1Jun 15, 2010
Method of fabricating CMOS devices using fluid-based dielectric materials
XILINX INC8 citations82
US7673270B1Mar 2, 2010
Method and apparatus for compensating an integrated circuit layout for mechanical stress effects
XILINX INC14 citations82
US10629512B2Apr 21, 2020
Integrated circuit die with in-chip heat sink
XILINX INC4 citations73
US9385127B2Jul 5, 2016
Method and apparatus for suppressing metal-gate cross-diffusion in semiconductor technology
XILINX INC2 citations62
NEUROPREX INC
3 patentsUS9205275B2Dec 8, 2015
Devices and methods for magnetic stimulation for the treatment of neurological disorders
NEUROPREX INC12 citations79
US10434323B2Oct 8, 2019
Devices and methods for magnetic stimulation for the treatment of neurological disorders
NEUROPREX INC0 citations47
US9814898B2Nov 14, 2017
Devices and methods for magnetic stimulation for the treatment of neurological disorders
NEUROPREX INC0 citations47