Inventor
NARENDRNATH KADTHALA RAMAYA
US19 patents
⚠️ This page may combine multiple inventors who share the name “NARENDRNATH KADTHALA RAMAYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
15 patentsUS9993907B2Jun 12, 2018
Printed chemical mechanical polishing pad having printed window
APPLIED MATERIALS INC38 citations94
US9685356B2Jun 20, 2017
Substrate support assembly having metal bonded protective layer
APPLIED MATERIALS INC18 citations84
US9669653B2Jun 6, 2017
Electrostatic chuck refurbishment
APPLIED MATERIALS INC11 citations84
US9627231B2Apr 18, 2017
Methods for bonding substrates
APPLIED MATERIALS INC7 citations82
US11179965B2Nov 23, 2021
Electrostatic chuck optimized for refurbishment
APPLIED MATERIALS INC2 citations73
US10056284B2Aug 21, 2018
Electrostatic chuck optimized for refurbishment
APPLIED MATERIALS INC3 citations73
US11738421B2Aug 29, 2023
Method of making carrier head membrane with regions of different roughness
APPLIED MATERIALS INC1 citations72
US11007619B2May 18, 2021
Carrier head membrane with regions of different roughness
APPLIED MATERIALS INC3 citations72
US11161218B2Nov 2, 2021
Window in thin polishing pad
APPLIED MATERIALS INC1 citations71
US10213894B2Feb 26, 2019
Method of placing window in thin polishing pad
APPLIED MATERIALS INC1 citations71
US12172264B2Dec 24, 2024
Carrier head membrane with regions of different roughness
APPLIED MATERIALS INC0 citations62
US11826875B2Nov 28, 2023
Window in thin polishing pad
APPLIED MATERIALS INC0 citations60
US11417561B2Aug 16, 2022
Edge ring for a substrate processing chamber
APPLIED MATERIALS INC0 citations60
US7848076B2Dec 7, 2010
Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing
APPLIED MATERIALS INC3 citations59
US10131126B2Nov 20, 2018
Methods for bonding substrates
APPLIED MATERIALS INC1 citations50