Inventor
PARK CHANG SEO
US29 patents
⚠️ This page may combine multiple inventors who share the name “PARK CHANG SEO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
DOOSAN CORP
7 patentsUS6372236B1Apr 16, 2002
Cream composition for skin care
DOOSAN CORP14 citations82
US6638735B1Oct 28, 2003
Plasmid for gene expression in pichia ciferrii and transformation method using the same
DOOSAN CORP6 citations72
US5958742ASep 28, 1999
Microbiological method for preparing sphingolipids using a novel yeast pichia ciferrii DSCC 7-25
DOOSAN CORP10 citations70
US6403111B1Jun 11, 2002
Method for preparing aqueous phytosphingosine solution
DOOSAN CORP6 citations61
US6964952B2Nov 15, 2005
Therapeutic composition for broad spectrum dermal disease
DOOSAN CORP2 citations59
US6194196B1Feb 27, 2001
Yeast Pichia ciferrii
DOOSAN CORP1 citations49
US8022051B2Sep 20, 2011
Composition for protection and improvement of skin, or reinforcing skin barrier function comprising phosphatidylserine
DOOSAN CORP0 citations42
HYUNDAI ELECTRONICS IND
6 patentsUS6551913B1Apr 22, 2003
Method for fabricating a gate electrode of a semiconductor device
HYUNDAI ELECTRONICS IND35 citations92
US5994238ANov 30, 1999
Method for fabricating semiconductor device with control of oxide to silicon etching selectivity
HYUNDAI ELECTRONICS IND22 citations92
US6277738B1Aug 21, 2001
Method of manufacturing a semiconductor device capable of reducing contact resistance
HYUNDAI ELECTRONICS IND16 citations84
US6114241ASep 5, 2000
Method of manufacturing a semiconductor device capable of reducing contact resistance
HYUNDAI ELECTRONICS IND16 citations84
US6355516B1Mar 12, 2002
Method of manufacturing a capacitor with a bi-layer Ta2O5 capacitor dielectric in a semiconductor device including performing a plasma treatment on the first Ta2O5 layer
HYUNDAI ELECTRONICS IND11 citations74
US6303427B1Oct 16, 2001
Method of manufacturing a capacitor in a semiconductor device
HYUNDAI ELECTRONICS IND14 citations74
PARK CHANG SEO
5 patentsUS8536040B1Sep 17, 2013
Techniques for using material substitution processes to form replacement metal gate electrodes of semiconductor devices with self-aligned contacts
PARK CHANG SEO60 citations97
US8541286B2Sep 24, 2013
Methods for fabricating integrated circuits
PARK CHANG SEO22 citations92
US8722491B2May 13, 2014
Replacement metal gate semiconductor device formation using low resistivity metals
PARK CHANG SEO15 citations83
US8431472B2Apr 30, 2013
Semiconductor device fabrication using gate substitution
PARK CHANG SEO1 citations51
US8409466B2Apr 2, 2013
Composition comprising ionized germanuim dioxide, method of making and use thereof
PARK CHANG SEO0 citations51
GLOBALFOUNDRIES INC
3 patentsUS10453936B2Oct 22, 2019
Methods of forming replacement gate structures on transistor devices
GLOBALFOUNDRIES INC2 citations71
US10832966B2Nov 10, 2020
Methods and structures for a gate cut
GLOBALFOUNDRIES INC1 citations60
US8716094B1May 6, 2014
FinFET formation using double patterning memorization
GLOBALFOUNDRIES INC1 citations51