Inventor
TSAI KUEN-YU
TW17 patents
⚠️ This page may combine multiple inventors who share the name “TSAI KUEN-YU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
9 patentsUS10665696B2May 26, 2020
Method for non-resist nanolithography
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US9972702B2May 15, 2018
Method for non-resist nanolithography
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US9934969B2Apr 3, 2018
Charged-particle-beam patterning without resist
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12308368B2May 20, 2025
Method for non-resist nanolithography
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11855190B2Dec 26, 2023
Methods for non-resist nanolithography
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11532729B2Dec 20, 2022
Method for non-resist nanolithography
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10615036B2Apr 7, 2020
Charged-particle-beam patterning without resist
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10007752B2Jun 26, 2018
Determining proximity effect parameters for non rectangular semiconductor structures
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
US9418049B2Aug 16, 2016
Method and system for establishing parametric model
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations41
TSAI KUEN-YU
6 patentsUS9087173B2Jul 21, 2015
Determining proximity effect parameters for non-rectangular semiconductor structures
TSAI KUEN-YU12 citations80
US8438505B2May 7, 2013
Method for improving accuracy of parasitics extraction considering sub-wavelength lithography effects
TSAI KUEN-YU8 citations77
US9541500B2Jan 10, 2017
Method for calibrating a manufacturing process model
TSAI KUEN-YU2 citations67
US8539392B2Sep 17, 2013
Method for compensating proximity effects of particle beam lithography processes
TSAI KUEN-YU2 citations57
US8578303B1Nov 5, 2013
Method for compensating effect of patterning process and apparatus thereof
TSAI KUEN-YU4 citations50
US8490033B2Jul 16, 2013
Method and apparatus for designing patterning system based on patterning fidelity
TSAI KUEN-YU1 citations44