Inventor
KAMIMURA SOU
JP26 patents
⚠️ This page may combine multiple inventors who share the name “KAMIMURA SOU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIFILM CORP
11 patentsUS7615330B2Nov 10, 2009
Positive resist composition and pattern formation method using the same
FUJIFILM CORP9 citations84
US9897922B2Feb 20, 2018
Method of forming pattern and developer for use in the method
FUJIFILM CORP10 citations83
US7718344B2May 18, 2010
Resist composition and pattern forming method using the same
FUJIFILM CORP14 citations83
US9128376B2Sep 8, 2015
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
FUJIFILM CORP4 citations73
US12346026B2Jul 1, 2025
Composition for forming underlayer film, resist pattern forming method, and manufacturing method of electronic device
FUJIFILM CORP0 citations62
US10248019B2Apr 2, 2019
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
FUJIFILM CORP1 citations62
US9482958B2Nov 1, 2016
Method of forming pattern and developer for use in the method
FUJIFILM CORP2 citations62
US7695892B2Apr 13, 2010
Resist composition and pattern-forming method using same
FUJIFILM CORP2 citations62
US8753802B2Jun 17, 2014
Pattern forming method, chemical amplification resist composition and resist film
FUJIFILM CORP0 citations52
US9513547B2Dec 6, 2016
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
FUJIFILM CORP0 citations42
US8859192B2Oct 14, 2014
Negative pattern forming method and resist pattern
FUJIFILM CORP0 citations41
ENOMOTO YUICHIRO
5 patentsUS8999621B2Apr 7, 2015
Pattern forming method, chemical amplification resist composition and resist film
ENOMOTO YUICHIRO4 citations72
US9097973B2Aug 4, 2015
Method of forming pattern and developer for use in the method
ENOMOTO YUICHIRO2 citations61
US9223219B2Dec 29, 2015
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
ENOMOTO YUICHIRO0 citations51
US8871642B2Oct 28, 2014
Method of forming pattern and developer for use in the method
ENOMOTO YUICHIRO0 citations51
US9116437B2Aug 25, 2015
Pattern forming method, chemical amplification resist composition and resist film
ENOMOTO YUICHIRO0 citations40
KAMIMURA SOU
3 patentsUS8110333B2Feb 7, 2012
Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound
KAMIMURA SOU10 citations82
US8709704B2Apr 29, 2014
Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method
KAMIMURA SOU4 citations71
US8092976B2Jan 10, 2012
Resist composition and pattern forming method using the same
KAMIMURA SOU0 citations40
IWATO KAORU
3 patentsUS9760003B2Sep 12, 2017
Pattern forming method and actinic-ray- or radiation-sensitive resin composition
IWATO KAORU2 citations72
US10126653B2Nov 13, 2018
Pattern forming method and resist composition
IWATO KAORU0 citations40
US8808965B2Aug 19, 2014
Pattern forming method, pattern, chemical amplification resist composition and resist film
IWATO KAORU0 citations40