Inventor
TARUTANI SHINJI
JP33 patents
⚠️ This page may combine multiple inventors who share the name “TARUTANI SHINJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIFILM CORP
12 patentsUS8034547B2Oct 11, 2011
Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method
FUJIFILM CORP70 citations98
US8017304B2Sep 13, 2011
Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method
FUJIFILM CORP79 citations98
US8933144B2Jan 13, 2015
Curable composition for imprint, pattern-forming method and pattern
FUJIFILM CORP50 citations94
US9897922B2Feb 20, 2018
Method of forming pattern and developer for use in the method
FUJIFILM CORP10 citations83
US9663671B2May 30, 2017
Curable composition for imprints and method of storing the same
FUJIFILM CORP3 citations73
US9507263B2Nov 29, 2016
Underlay film composition for imprints and method of forming pattern and pattern formation method using the same
FUJIFILM CORP5 citations72
US7635553B2Dec 22, 2009
Pattern forming method and resist composition used therefor
FUJIFILM CORP4 citations63
US7294450B2Nov 13, 2007
Chemical amplification-type resist composition and production process thereof
FUJIFILM CORP3 citations63
US9482958B2Nov 1, 2016
Method of forming pattern and developer for use in the method
FUJIFILM CORP2 citations62
US7425404B2Sep 16, 2008
Chemical amplification resist composition and pattern-forming method using the same
FUJIFILM CORP2 citations62
US8753802B2Jun 17, 2014
Pattern forming method, chemical amplification resist composition and resist film
FUJIFILM CORP0 citations52
US7338744B2Mar 4, 2008
Positive resist composition and pattern forming method using the same
FUJIFILM CORP1 citations52
ENOMOTO YUICHIRO
8 patentsUS8999621B2Apr 7, 2015
Pattern forming method, chemical amplification resist composition and resist film
ENOMOTO YUICHIRO4 citations72
US8911930B2Dec 16, 2014
Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and pattern
ENOMOTO YUICHIRO2 citations62
US9097973B2Aug 4, 2015
Method of forming pattern and developer for use in the method
ENOMOTO YUICHIRO2 citations61
US9223219B2Dec 29, 2015
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
ENOMOTO YUICHIRO0 citations51
US8877828B2Nov 4, 2014
Method for producing curable composition for imprints
ENOMOTO YUICHIRO0 citations51
US8871642B2Oct 28, 2014
Method of forming pattern and developer for use in the method
ENOMOTO YUICHIRO0 citations51
US8820541B2Sep 2, 2014
Method for producing curable composition for imprints
ENOMOTO YUICHIRO0 citations51
US9116437B2Aug 25, 2015
Pattern forming method, chemical amplification resist composition and resist film
ENOMOTO YUICHIRO0 citations40