Inventor
IYER RAMASESHAN SURYANARAYANAN
US2 patents
Patents
2 patentsUS6713127B2Mar 30, 2004
Methods for silicon oxide and oxynitride deposition using single wafer low pressure CVD
APPLIED MATERIALS INC82 citations96
US7119016B2Oct 10, 2006
Deposition of carbon and nitrogen doped poly silicon films, and retarded boron diffusion and improved poly depletion
APPLIED MATERIALS INC10 citations69