Inventor
BOHLEN HARALD
DE14 patents
Patents
14 patentsUS4448865AMay 15, 1984
Shadow projection mask for ion implantation and ion beam lithography
IBM63 citations96
US4426584AJan 17, 1984
Method of compensating the proximity effect in electron beam projection systems
IBM70 citations95
US4417946ANov 29, 1983
Method of making mask for structuring surface areas
IBM34 citations92
US4370554AJan 25, 1983
Alignment system for particle beam lithography
IBM33 citations92
US4169230ASep 25, 1979
Method of exposure by means of corpuscular beam shadow printing
IBM33 citations92
US4591540AMay 27, 1986
Method of transferring a pattern into a radiation-sensitive layer
IBM39 citations91
US4522893AJun 11, 1985
Contact device for releasably connecting electrical components
IBM41 citations86
US4504558AMar 12, 1985
Method of compensating the proximity effect in electron beam projection systems
IBM26 citations81
US4342817AAug 3, 1982
Mask for structuring surface areas, and method of making it
IBM14 citations73
US4578587AMar 25, 1986
Error-corrected corpuscular beam lithography
IBM15 citations72
US4554458ANov 19, 1985
Electron beam projection lithography
IBM16 citations72
US4513203AApr 23, 1985
Mask and system for mutually aligning objects in ray exposure systems
IBM19 citations72
US4334156AJun 8, 1982
Method of shadow printing exposure
IBM14 citations72
US4267259AMay 12, 1981
Exposure process
IBM3 citations60