Inventor
ENKISCH HARTMUT
DE26 patents
⚠️ This page may combine multiple inventors who share the name “ENKISCH HARTMUT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
17 patentsUS10545323B2Jan 28, 2020
Projection optical unit for EUV projection lithography
ZEISS CARL SMT GMBH13 citations85
US10809625B2Oct 20, 2020
Intensity adaptation filter for EUV microlithography, method for producing same, and illumination system having a corresponding filter
ZEISS CARL SMT GMBH2 citations73
US10061204B2Aug 28, 2018
Mirror, in particular for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH2 citations72
US10423073B2Sep 24, 2019
Method for producing a mirror element
ZEISS CARL SMT GMBH5 citations71
US11073765B2Jul 27, 2021
Method for producing a reflective optical element and reflective optical element
ZEISS CARL SMT GMBH1 citations62
US9341958B2May 17, 2016
Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror
ZEISS CARL SMT GMBH2 citations62
US10331048B2Jun 25, 2019
Mirror, in particular for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations59
US12406777B2Sep 2, 2025
Optical element for a EUV projection exposure system
ZEISS CARL SMT GMBH0 citations54
US9778576B2Oct 3, 2017
Microlithography illumination system and microlithography illumination optical unit
ZEISS CARL SMT GMBH1 citations52
US10146136B2Dec 4, 2018
Reflecting coating with optimized thickness
ZEISS CARL SMT GMBH1 citations51
US9720329B2Aug 1, 2017
Projection objective of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations51
US10916356B2Feb 9, 2021
Reflective optical element
ZEISS CARL SMT GMBH0 citations49
US9285515B2Mar 15, 2016
Imaging optical system and projection exposure system including the same
ZEISS CARL SMT GMBH0 citations47
US9606446B2Mar 28, 2017
Reflective optical element for EUV lithography and method of manufacturing a reflective optical element
ZEISS CARL SMT GMBH0 citations40
US10598921B2Mar 24, 2020
Mirror element, in particular for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations39
US10520827B2Dec 31, 2019
Optical system, in particular for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations38
US9915873B2Mar 13, 2018
Reflective optical element, and optical system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations36
ZEISS CARL SMT AG
4 patentsUS7672044B2Mar 2, 2010
Lens made of a crystalline material
ZEISS CARL SMT AG3 citations62
US7646004B2Jan 12, 2010
Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element
ZEISS CARL SMT AG2 citations58
US7429116B2Sep 30, 2008
Projection objective and method for its manufacture
ZEISS CARL SMT AG1 citations51
US7292388B2Nov 6, 2007
Lens made of a crystalline material
ZEISS CARL SMT AG0 citations51