Inventor

DUTARTRE DIDIER

FR47 patents

⚠️ This page may combine multiple inventors who share the name “DUTARTRE DIDIER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

DUTARTRE DIDIER

ST MICROELECTRONICS SA

Low-noise vertical bipolar transistor and corresponding fabrication process

Process for fabricating a substrate of the silicon-on-insulator or silicon-on-nothing type and resulting device

Method for fabricating a bipolar transistor of the self-aligned double-polysilicon type with a heterojunction base and corresponding transistor

Method for integrating silicon-on-nothing devices with standard CMOS devices

Pinned photodiode with a low dark current

Method of manufacturing a bipolar transistor of double-polysilicon, heterojunction-base type and corresponding transistor

Method for manufacture of a semiconductor wafer suitable for the manufacture of an SOI substrate, and SOI substrate wafer thus obtained

Vibratory beam electromechanical resonator

Characterizing of silicon-germanium areas on silicon

Vertical bipolar transistor having little low-frequency noise and high current gain, and corresponding fabrication process

Method of epitaxy on a silicon substrate comprising areas heavily doped with arsenic

Process for fabricating a network of nanometric lines made of single-crystal silicon and device obtained

Bipolar transistor manufacturing

Transistor with a channel comprising germanium

Method for etching silicon-germanium in the presence of silicon

Fabrication processes for semiconductor non-volatile memory device

Method of epitaxy on a silicon substrate comprising areas heavily doped with arsenic

Method for manufacture of a semiconductor wafer suitable for the manufacture of an SOI substrate, and SOI substrate wafer thus obtained

Front-side imager having a reduced dark current on SOI substrate

Imager having a reduced dark current through an increased bulk doping level

Forming of a single-crystal semiconductor layer portion separated from a substrate

Emission process for a single photon, corresponding semiconducting device and manufacturing process

Method of epitaxy on a silicon substrate comprising areas heavily doped with boron

Method for forming an electrical contact between a semiconductor film and a bulk handle wafer, and resulting structure

Integrated capacitor with high voltage linearity and low series resistance

ST MICROELECTRONICS CROLLES 2 SAS

Method for forming an electrical contact between a semiconductor film and a bulk handle wafer, and resulting structure

Integrated circuit comprising a substrate equipped with a trap-rich region, and fabricating process

Integrated optical sensor with pinned photodiodes

Integrated circuit comprising a substrate equipped with a trap-rich region, and fabricating process

Method of forming strained MOS transistors

Method for forming an electrical contact between a semiconductor film and a bulk handle wafer, and resulting structure

Memory cell comprising a phase-change material

ST MICROELECTRONICS CROLLES 2

Process for producing at least one deep trench isolation

Method for forming silicon wells of different crystallographic orientations

Method for protection of a layer of a vertical stack and corresponding device

DUTARTRE DIDIER

Process for forming a silicon-based single-crystal portion

Method for depositing a silicon oxide layer of same thickness on silicon and on silicon-germanium

Realization of self-positioned contacts by epitaxy

SGS THOMSON MICROELECTRONICS

Method of implementation of MOS transistor gates with a high content

Method for calibrating the temperature of an epitaxy reactor

HAOND MICHEL

Process for the production of mutually electrically insulated monocrystalline silicon islands using laser recrystallization

AUTONOME DE DROIT PUBLIC FRANC

Method for cleaning the surface of a substrate with plasma

SOITEC SILICON ON INSULATOR

Method for measuring thickness variations in a layer of a multilayer semiconductor structure

FRANCE ETAT

Process for the production of an insulating support on an oriented monocrystalline silicon film with localized defects

TISSIER ANNIE

Method of measuring the flowing of a material

ST MICROELECTRONICS SRL

Semiconductor chip manufacturing method

MARTY MICHEL

Microelectronic device, in particular back side illuminated image sensor, and production process