Inventor

Chen chang-yin

TW75 patents

⚠️ This page may combine multiple inventors who share the name “Chen chang-yin”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

Chen chang-yin

TAIWAN SEMICONDUCTOR MFG CO LTD

Fin field effect transistor (FinFET) device structure and method for forming the same

Fin field effect transistor (FinFET) device structure and method for forming the same

Semiconductor structure and manufacturing method thereof

Semiconductor structure and fabricating method thereof

Gate structure of field effect transistor with footing

FinFET device and method of forming and monitoring quality of the same

Gate structure of field effect transistor with footing

Mechanisms for forming FinFET device

Fin field effect transistor (FinFET) device and method for forming the same

Indented gate end of non-planar transistor

Apparatus and method of manufacturing fin-FET devices

Gate structure of field effect transistor with footing

Metal gate and manufuacturing process thereof

Methods of forming a semiconductor device with a gate stack having tapered sidewalls

Semiconductor device structure and method for forming the same

Fin field effect transistor (FinFET) device with controlled end-to-end critical dimension and method for forming the same

FinFET device and method of forming and monitoring quality of the same

Mechanisms for forming FinFET device

Notched gate structure fabrication

Notched gate structure fabrication

Semiconductor structure and fabricating method thereof

FinFET device and method of forming and monitoring quality of the same

Mechanisms for forming FINFET device

Gate structure of field effect transistor with footing

Fin field effect transistor (FinFET) device structure and method for forming the same

High-K film apparatus and method

Embedded source or drain region of transistor with laterally extended portion

Semiconductor structure and manufacturing method thereof

Field effect transistor with non-doped channel

Fin field effect transistor (FinFET) device and method for forming the same

Semiconductor device structure with work function layer and method for forming the same

Semiconductor device structure and method for forming the same

Semiconductor device having gate spacers extending below a fin top surface

Semiconductor device

Semiconductor device with fin isolation

FinFET device and method of forming and monitoring quality of the same

Mechanisms for forming FinFET device

Method of manufacturing a semiconductor and a semiconductor device

Semiconductor device

Notched gate structure fabrication

Method of forming semiconductor device with fin isolation

Semiconductor device with fin isolation

Gate structure of field effect transistor with footing

Method of manufacturing a semiconductor device and a semiconductor device

Methods of forming isolation features in metal gates

Semiconductor device

Semiconductor device structure with work function layer and method for forming the same

Gate structure of semiconductor device and method for forming the same

Fin field effect transistor (FinFET) device and method for forming the same

TAIWAN SEMICONDUCTOR MFG

High-K film apparatus and method